Planar waveguides in BiB3O6 and Nd:YVO4 crystals by ion implantation

Abstract BiB3O6 and Nd:YVO4 planar waveguides were fabricated by MeV Si+ (with a dose of 1×1014 ions/cm2) and Cu+ (with a dose of 1×1015 ions/cm2) ion implantation, respectively. Prism coupling method was used to observe the dark modes of the BiB3O6 and Nd:YVO4 waveguides. Reflectivity calculation method (RCM) was applied to simulate the refractive index profiles in the guiding layer. Obvious positive refractive index changes in the surface layer were induced by the ion implantation, which confined the region beneath the surface for many microns to be waveguide structures.