Chemical etching of thin SiOxCyHz films by post-deposition exposure to oxygen plasma
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Research context
OpenAlex topics: Semiconductor materials and devices · Plasma Diagnostics and Applications · ZnO doping and properties
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References (12)
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12. Vallée · Thin Solid Films · 1997 · 311 · 21210.1016/S0040-6090(97)00471-9 ↗