Static and kinetic friction characteristics of nanowire on different substrates

Abstract Friction characteristics of nanowires (NWs), which may be used as building blocks for nano-devices, are crucial, especially for cases where contact sliding occurs during the device operation. In this work, the static and kinetic friction characteristics of oxidized Si NWs deposited on thermally grown SiO 2 and chemical vapor-deposited single layer graphene were investigated using an atomic force microscope (AFM). Kinetic friction between the oxidized Si NWs and the substrates was directly measured by the AFM. Static friction was also obtained from the most bent state of the NWs using the individually determined elastic moduli of the NWs from kinetic friction experiments based on elastic beam theory. Furthermore, the shear stress between the oxidized Si NWs and the substrates was estimated based on adhesive contact theory. It was found that both static and kinetic friction increased as the radius of the NWs increased. The friction of the oxidized Si NWs on the graphene substrate was found to be smaller than that on the SiO 2 substrate, which suggests that chemical vapor-deposited graphene can be used as a lubricant or as a protective layer in nano-devices to reduce friction. The shear stress estimated from the kinetic friction data between the oxidized Si NWs and the SiO 2 substrate ranged from 7.5 to 12.3 MPa while that between the oxidized Si NWs and the graphene substrate ranged from 4.7 to 7.0 MPa. The result also indicated that the dependence of shear stress on the radius of the NWs was not significant. These findings may provide insight into the friction characteristics of NWs.