Effect of W–Ti target composition on the surface chemistry and electronic structure of WO3–TiO2 films made by reactive sputtering
Source abstract
Abstract
Abstract Tungsten–titanium (W–Ti) mixed oxide thin films were fabricated using reactive sputtering of W–Ti alloy targets with Ti content ranging from 0 to 30 wt%. The effect of target composition on film structure, surface/interface chemistry and chemical valence state of the W and Ti cations was investigated in detail. All films were amorphous in nature as confirmed by X-ray diffraction analyses. For growth times of 1 h, the thicknesses of the W–Ti–O films decreased significantly from 150 to 35 nm with increasing Ti content in the target, confirming that the oxide film growth behavior is dependent on the sputter-target composition. The chemistry and composition of the films probed using X-ray photoelectron spectroscopy (XPS) confirms the existence of W and Ti in their highest oxidation states of 6+ and 4+, respectively. Quantification of binding energy shifts for W and Ti core-level transitions confirms the formation of WO 3 –TiO 2 composite oxide films. Depth profiles confirm and validate film uniformity, as well as film thickness differences and variable oxidation behavior of W and Ti in the films.
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Research context
OpenAlex topics: Transition Metal Oxide Nanomaterials · ZnO doping and properties · Ga2O3 and related materials
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