Comparative study of electroless nickel film on different organic acids modified cuprammonium fabric (CF)

Abstract Nickel films were grown on citric acid (CA), malic acid (MA) and oxalic acid (OA) modified cuprammonium fabric (CF) substrates via electroless nickel deposition. The nickel films were examined using scanning electron microscopy (SEM) and X-ray diffraction (XRD). Their individual deposition rate and electromagnetic interference (EMI) shielding effectiveness (SE) were also investigated to compare the properties of electroless nickel films. SEM images illustrated that the nickel film on MA modified CF substrate was smooth and uniform, and the density of nickel nuclei was much higher. Compared with that of CA modified CF, the coverage of nickel nuclei on OA and MA modified CF substrate was very limited and the nickel particles size was too big. XRD analysis showed that the nickel films deposited on the different modified CF substrates had a structure with Ni (1 1 1) preferred orientation. All the nickel coatings via different acid modification were firmly adhered to the CF substrates, as demonstrated by an ultrasonic washing test. The result of tensile test indicated that the electroless nickel plating on CF has ability to strengthen the CF substrate while causes limited effect on tensile elongation. Moreover, the nickel film deposited on MA modified CF substrate showed more predominant in EMI SE than that deposited on CA or OA modified CF.