Growth and characteristics of hydrogenated In-doped ZnO thin films by pulsed DC magnetron sputtering

Abstract We investigated the role of hydrogen impurities in highly oriented In-doped ZnO (IZO:H) films. The conductivity of ZnO:H films exhibit small variation despite the increase of hydrogen ratio. The small variation of the carrier concentration in IZO:H films can be explained by the reduction of the oxygen deficiency for the charge neutrality and the increase of Vzn–H bonding for partially charge compensation in the films. The additional mode at 573 cm −1 is interpreted as vacancy clusters. The discrepancy between the increase of vacancy clusters (573 cm −1 ) and small variation of carrier concentration is attributed to the different physical characteristics of the IZO:H films due to the hydrogen existence between bulk and surface. The measured FT-IR peak at 3500 cm −1 exhibits typical characteristic of O–H bonding.