Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft X-ray interference lithography
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Plasmonic and Surface Plasmon Research · Photonic Crystals and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (26)
Show source-provided references
1. Nanoscale advances in catalysis and energy applications10.1021/nl101807g ↗
2. Experimental evidence for the nanocage effect in catalysis with hollow nanoparticles10.1021/nl102497u ↗
3. A comparison study of the catalytic properties of Au-based nanocages, nanoboxes, and nanoparticles10.1021/nl903062e ↗
4. Homogeneous gold catalysis beyond assumptions and proposals—characterized intermediates10.1002/anie.200907078 ↗
5. Nanostructured surfaces and assemblies as SERS media10.1002/smll.200800337 ↗
6. Novel nanostructures for SERS biosensing10.1016/S1748-0132(08)70042-2 ↗
7. Practical understanding and use of surface enhanced Raman scattering/surface enhanced resonance Raman scattering in chemical and biological analysis10.1039/b708841h ↗
8. Nanostructured plasmonic sensors10.1021/cr068126n ↗
9. Metal nanodot memory by self-assembled block copolymer lift-off10.1021/nl903340a ↗
10. Optically transparent, ultrathin Pt films as versatile metal substrates for molecular optoelectronics10.1002/adfm.200500893 ↗
11. Gold nanoparticles for biology and medicine10.1002/anie.200904359 ↗
12. Broadband light output enhancement for scintillator using whispering-gallery modes in nanospheres10.1002/pssa.201431032 ↗
13. Improved light extraction efficiency of cerium-doped lutetium-yttrium oxyorthosilicate scintillator by monolayers of periodic arrays of polystyrene spheres10.1063/1.4793303 ↗
14. Photolithography reaches 6 nm half-pitch using extreme ultraviolet light10.1117/1.JMM.15.3.033505 ↗
15. High-resolution and large-area nanoparticle arrays using EUV interference lithography10.1039/C5NR00565E ↗
16. Beyond EUV lithography: a comparative study of efficient photoresists’ performance10.1038/srep09235 ↗
17. Interference lithography at EUV and soft X-ray wavelengths: principles, methods, and applications10.1016/j.mee.2015.03.047 ↗
18. Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5nm technology node and beyond10.1039/C4NR07420C ↗
19. Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths10.1364/OL.39.002286 ↗
20. Large area arrays of metal nanowires10.1016/j.mee.2008.01.064 ↗
21. Development of broadband X-ray interference lithography large area exposure system10.1063/1.4947067 ↗
22. Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography10.1016/j.mee.2016.12.028 ↗
23. Developments at SSRF in soft X-ray interference lithography
24. High-performance soft x-ray spectromicroscopy beamline at SSRF10.1063/1.3491837 ↗
25. Numerical analysis of partially coherent radiation at soft x-ray beamline10.1364/OE.23.029675 ↗
26. Recent R&D trends in inorganic single-crystal scintillator materials for radiation detection10.1002/adom.201400571 ↗