Characterization and thermal shock behavior of Y 2 O 3 films deposited on freestanding CVD diamond substrates
Source abstract
Abstract
Abstract Y 2 O 3 anti-reflection films were deposited on freestanding CVD diamond substrates by radio frequency magnetron sputtering. The thermal shock resistance and oxidation resistance of Y 2 O 3 /diamond/Y 2 O 3 samples at 727 °C and 800 °C in atmospheric air were investigated. No delamination of the Y 2 O 3 films occurred after thermal shock, thereby demonstrating extreme adhesion to freestanding diamond substrates. After thermal shock, Y atoms in the films were almost fully oxidized. Moreover, the majority of monoclinic phase in the Y 2 O 3 films transformed into cubic phase, crystallinity was enhanced, and the average grain size significantly increased. The maximum transmittance in the 8–12 μm long-wave IR range of the Y 2 O 3 /diamond/Y 2 O 3 samples increased from 81.3% ± 0.3% to 84.7% ± 0.2% and 83.6% ± 0.4%. These findings indicated that the Y 2 O 3 anti-reflection films displayed good resistance to thermal shock and provided sufficient protection for diamond substrates against elevated temperature oxidation.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · High-pressure geophysics and materials · Advanced Fiber Laser Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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