Monte-Carlo simulation of laser ablated plasma for thin film deposition
Source abstract
Abstract
Monte-Carlo (MC) simulation is employed to study the laser induced carbon plasma used for deposition of thin carbon films. The bifurcation of the laser ablated plume expanding in an ambient atmosphere in to fast and slow components is discussed. The dependence of the film profile on to a substrate on pressure of ambient gas and distance between the target and the substrate is presented.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Laser-induced spectroscopy and plasma · Ion-surface interactions and analysis
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References (28)
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