journal article·2014-10

A study on the crystallization behavior of Sn-doped amorphous Ge 2 Sb 2 Te 5 by ultraviolet laser radiation

N. Bai, F.R. Liu, X.X. Han, Z. Zhu, F. Liu, X. Lin, N.X. Sun

Publisher page

Abstract

Abstract In this paper, the influence of Sn doping (0%, 8% and 14%) on the crystallization of Ge2Sb2Te5 was studied with the aid of an ultraviolet laser. The XRD analyses revealed that the addition of Sn maintained the NaCl-type structure of Ge2Sb2Te5 after crystallization but expanded the lattice parameter due to the smaller atomic radii of Ge replaced by Sn. Raman peaks (123, 150 and 110 cm−1) moved towards lower wavenumbers (118, 137 and 104 cm−1), which can be explained by the remarkable decrease of the binding energy from Ge–Te to Sn–Te. A remarkable increase in optical contrast from 15% to 40% was observed in the Sn-doped Ge2Sb2Te5 film after crystallization with both the isothermal annealing and laser radiance. While the optical contrast changed little for a fixed volume fraction of Sn-doped sample with the variation of laser fluence which is attributed to the crystallization mechanism induced by laser under different fluences is the same.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Phase-change materials and chalcogenides · Glass properties and applications · Chalcogenide Semiconductor Thin Films

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (33)

Show source-provided references
1. Ovshinsky · Phys. Rev. Lett. · 1968 · 21 · 145010.1103/PhysRevLett.21.1450 ↗
2. Raoux · MRS Bull. · 2012 · 37 · 11810.1557/mrs.2011.357 ↗
3. Siegrist · Nat. Mater. · 2011 · 10 · 20210.1038/nmat2934 ↗
4. Wuttig · Nat. Mater. · 2005 · 4 · 26510.1038/nmat1359 ↗
5. Lankhorst · Jpn. J. Appl. Phys. · 2003 · 42 · 86310.1143/JJAP.42.863 ↗
6. Bensch · Chem. Unserer Zeit · 2010 · 44 · 9210.1002/ciuz.201000493 ↗
7. Buller · Chem. Mater. · 2012 · 24 · 358210.1021/cm301809g ↗
8. Gan · Sci. Eng. B · 2000 · 76 · 6310.1016/S0921-5107(00)00400-1 ↗
9. Itonaga · Jpn. J. Appl. Phys. · 2000 · 39 · 97810.1143/JJAP.39.978 ↗
10. Lee · Jpn. J. Appl. Phys. · 1999 · 39 · 636910.1143/JJAP.38.6369 ↗
11. Liu · Thin Solid Films · 2005 · 478 · 4910.1016/j.tsf.2004.09.057 ↗
12. Privitera · Appl. Phys. Lett. · 2004 · 85 · 304410.1063/1.1805200 ↗
13. Akiyama · Jpn. J. Appl. Phys. · 2001 · 40 · 159810.1143/JJAP.40.1598 ↗
14. Kojima · Jpn. J. Appl. Phys. · 2001 · 40 · 593010.1143/JJAP.40.5930 ↗
15. Cheng · Chin. Phys. Lett. · 2005 · 22 · 292910.1088/0256-307X/22/11/056 ↗
16. Zhang · Appl. Surf. Sci. · 2012 · 258 · 607510.1016/j.apsusc.2012.03.005 ↗
17. Wang · Microsyst. Technol. · 2007 · 13 · 20310.1007/s00542-006-0156-5 ↗
18. Xu · Electrochem. Solid-State Lett. · 2012 · 15 · H5910.1149/2.006203esl ↗
19. Zhou · Appl. Surf. Sci. · 2013 · 285P · 9710.1016/j.apsusc.2013.07.082 ↗
20. Wang · J. Appl. Phys. · 2004 · 96 · 3087
21. Nemec · J. Appl. Phys. · 2009 · 106 · 10350910.1063/1.3259435 ↗
22. Kozyukhin · Physics Procedia · 2013 · 44 · 8210.1016/j.phpro.2013.04.011 ↗
23. Yoon · J. Non-Cryst. Solids · 2006 · 352 · 375710.1016/j.jnoncrysol.2006.05.038 ↗
24. Bastiani · Appl. Phys. Lett. · 2008 · 92 · 24192510.1063/1.2945880 ↗
25. Andrikopoulos · J. Phys. Chem. Solids · 2007 · 68 · 107410.1016/j.jpcs.2007.02.027 ↗
26. De Bastiani · J. Appl. Phys. · 2010 · 107 · 11352110.1063/1.3437636 ↗
27. Liu · Chin. Phys. · 2004 · 13 · 194710.1088/1009-1963/13/11/033 ↗
28. Kozyukhin · Phys. Procedia · 2013 · 44 · 8210.1016/j.phpro.2013.04.011 ↗
29. Lee · Jpn. J. Appl. Phys. · 1999 · 38 · 636910.1143/JJAP.38.6369 ↗
30. Luo · Adv. Mater. · 2004 · 16 · 43910.1002/adma.200306077 ↗
31. Solis · J. Appl. Phys. · 1994 · 75 · 778810.1063/1.356584 ↗
32. Weidenhof · J. Appl. Phys. · 1999 · 86 · 587910.1063/1.371606 ↗
33. Liu · Appl. Phys. Lett. · 2013 · 103 · 05190510.1063/1.4817251 ↗