journal article·2010-11

Auger electron/X-ray photoelectron and cathodoluminescent spectroscopic studies of pulsed laser ablated SrAl2O4:Eu2+,Dy3+ thin films

P.D. Nsimama, O.M. Ntwaeaborwa, H.C. Swart

Applied Surface Science· Volume 257· Issue 2
Publisher page

Abstract

Abstract Auger electron/X-ray photoelectron and cathodoluminescent (CL) spectroscopic studies were conducted on pulsed laser deposited SrAl2O4:Eu2+,Dy3+ thin films and the correlation between the surface chemical reactions and the decrease in the CL intensity was determined. The Auger electron and the CL data were collected simultaneously in a vacuum chamber either maintained at base pressure or backfilled with oxygen gas. The data were collected when the films were irradiated for 14 h with 2 keV electrons. The CL emission peak attributed to the 4f65d1 → 4f7 transitions was observed at ∼521 nm and the CL intensity of the peaks degraded at different rates in different vacuum conditions. X-ray photoelectron spectroscopy (XPS) data collected from degraded films suggest that strontium oxide (SrO) and aliminium oxide (Al2O3) were formed on the surface of the film as a result of electron stimulated surface chemical reaction (ESSCR).
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Research context

OpenAlex topics: Luminescence Properties of Advanced Materials · Electronic and Structural Properties of Oxides · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (18)

Show source-provided references
1. Matsuzawa · J. Electrochem. Soc. · 1996 · 143 · 267010.1149/1.1837067 ↗
2. Katsumata · J. Electrochem. Soc. · 1997 · 144 · L24310.1149/1.1837931 ↗
3. Ngaruiya · Mater. Lett. · 2008 · 62 · 319210.1016/j.matlet.2008.02.016 ↗
4. Nsimama · Physica B · 2009 · 404 · 448910.1016/j.physb.2009.09.034 ↗
5. PHI Multipak™, Version 8.2C, Part number 706570, Software for Complete AES and XPS Data Reduction, Copyright 2007, Ulvac-PHI, Inc.
6. Diamond, Version 3.0d, Copyright© 1997–2005 Crystal Impact GbR, Bonn, Germany.
7. Sebastian · J. Vac. Sci. Technol. A · 1997 · 15 · 234910.1116/1.580746 ↗
8. Swart · J. Appl. Phys. · 1998 · 83 · 457810.1063/1.367240 ↗
9. Ntwaeaborwa · J. Phys. Chem. Solids · 2006 · 67 · 174910.1016/j.jpcs.2006.04.002 ↗
10. Ntwaeaborwa · J. Vac. Sci. Technol. A · 2007 · 25 · 115210.1116/1.2723771 ↗
11. Swart · J. Vac. Sci. Technol. A · 1996 · 14 · 169710.1116/1.580322 ↗
12. Ryu · Physica B · 2009 · 404 · 171410.1016/j.physb.2009.02.012 ↗
13. Ravichandran · Displays · 1999 · 19 · 19710.1016/S0141-9382(98)00050-X ↗
14. Klein · J. Catal. · 1983 · 82 · 42410.1016/0021-9517(83)90209-9 ↗
15. van Doveren · J. Electron Spectrosc. Relat. Phenom. · 1980 · 21 · 26510.1016/0368-2048(80)85055-9 ↗
16. H.C. Swart, E. Coetzee, J.J. Terblans, O.M. Ntwaeaborwa, P.D. Nsimama, F.B. Dejene, J.J. Dolo, J. Appl. Phys. A, doi:10.1007/s00339-010r-r5915-6.
17. Wagner · J. Vac. Sci. Technol. · 1982 · 21 · 93310.1116/1.571870 ↗
18. XPS International Inc. · 1999