Characterization of HfOxNy gate dielectrics using a hafnium oxide as target

Abstract Hafnium oxynitride (HfOxNy) gate dielectric has been deposited on Si (1 0 0) by means of radio frequency (rf) reactive sputtering using directly a HfO2 target in N2/Ar ambient. The thermal stability and microstructural characteristics for the HfOxNy films have been investigated. XPS results confirmed that nitrogen was successfully incorporated into the HfO2 films. XRD analyses showed that the HfOxNy films remain amorphous after 800 °C annealing in N2 ambient. Meanwhile the HfOxNy films can also effectively suppress oxygen diffusion during high temperature annealing and prevent interface layer from forming between HfOxNy films and Si substrates. AFM measurements demonstrated that surface roughness of the HfOxNy films increase slightly as compared to those pure HfO2 films after post deposition annealing. By virtue of building reasonable model structure, the optical properties of the HfOxNy films have been discussed in detail.