journal article·2005-05

Preparation of CaS:Cu,F thin-film electroluminescent devices with an emission including purple region

Shintaro Hakamata, Mami Ehara, Hiroko Kominami, Yoichiro Nakanishi, Yoshinori Hatanaka

Applied Surface Science· Volume 244· Issue 1-4
Publisher page

Abstract

CaS:Cu,F thin films have been prepared aiming at development of purple-blue emitting thin-film electroluminescent (TFEL) device with high luminance. The dependence of structural and photoluminescent (PL) properties of CaS:Cu,F thin films on annealing temperature and time was investigated. It was found that the annealing at higher than 800 °C was necessary. Moreover, improvement of crystallinity and PL properties of the films saturated for the annealing time longer than 10 min. It is concluded, therefore that the annealing at higher than 800 °C for about 10 min is desirable. CaS:Cu,F TFEL devices was fabricated on Si substrate. The purple-blue EL with an obvious peak at 425 nm was obtained from the device with 0.3 at.% of Cu for the first time.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Electrodeposition and Electroless Coatings · ZnO doping and properties · Copper-based nanomaterials and applications

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