journal article·2006-01

Preparation and characterization of iron oxide thin films by spray pyrolysis using methanolic and ethanolic solutions

J.D. Desai, H.M. Pathan, Sun-Ki Min, Kwang-Deog Jung, Oh-Shim Joo

Applied Surface Science· Volume 252· Issue 6
Publisher page

Abstract

Abstract Iron oxide thin films have been obtained by spray pyrolysis using 100% methanolic and ethanolic solutions of iron tri-chloride. The films were deposited onto ITO-coated glass substrates. The preparative conditions have been optimized to obtain compact, pin-hole-free and smooth thin films which are adherent to the substrate. The structural, morphological and compositional characterizations have been carried out by X-ray diffraction, scanning electron microscopy and energy dispersive X-ray analysis. The films deposited using ethanolic solution results into pure hematite; α-Fe2O3 thin films, however, films deposited using methanolic solution consists of hematite and maghemite-c phases of iron oxide. The films are nanocrystalline with particle size of 30–40 nm. The optical absorbance of the film was of the order of 105 cm−1. The optical band gap of films was found to be 2.26 and 2.20 eV for the films deposited using methanolic and ethanolic solutions, respectively.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Iron oxide chemistry and applications · Minerals Flotation and Separation Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (29)

Show source-provided references
1. Cornell · 2003
2. S. Kenichi, J. Akinide, T. Kiyohide, Japan Patents 61 (24) (1986) 147.
3. F. Sanehiro, Y. Sejji, N. Toshiyuki, Japan Patents 62 (160) (1981) 651.
4. K. Keiji, M. Itsuaki, Japan Patents, 79 (106) (1979) 78.10.1017/S0020268100018801 ↗
5. Ando · Nature · 2002 · 374 · 62510.1038/374625a0 ↗
6. Khader · Langmuir · 1987 · 3 · 30310.1021/la00074a028 ↗
7. Daza · J. Power Sources · 2000 · 86 · 32910.1016/S0378-7753(99)00499-1 ↗
8. Kung · 1989
9. Rofer-Depoorter · Chem. Rev. · 1981 · 81 · 44710.1021/cr00045a002 ↗
10. Hibst · 1994 · vol. 3B · 212
11. Jansen · Nature · 2000 · 404 · 98010.1038/35010082 ↗
12. West · 1986
13. Matsuoka · Nat. Tech. Rep. · 1978 · 24 · 461
14. Huo · Chem. Mater. · 2000 · 12 · 79010.1021/cm990690+ ↗
15. Orel · Thin Solid Films · 1994 · 246 · 13110.1016/0040-6090(94)90742-0 ↗
16. Pal · J. Chem. Technol. Biotechnol. · 1998 · 73 · 26910.1002/(SICI)1097-4660(1998110)73:3<269::AID-JCTB944>3.0.CO;2-3 ↗
17. Tianshu · J. Mater. Sci. · 2000 · 35 · 141910.1023/A:1004771216935 ↗
18. Kennedy · J. Electrochem. Soc. · 1983 · 130 · 1013
19. Bjorksten · Chem. Mater. · 1994 · 6 · 85810.1021/cm00042a026 ↗
20. Nomura · Thin Solid Films · 1985 · 128 · 22510.1016/0040-6090(85)90074-4 ↗
21. Qian · J. Solid State Chem. · 1991 · 92 · 20810.1016/0022-4596(91)90258-J ↗
22. Young Ma · Mater. Sci.: Mater. Electr. · 2004 · 15 · 77510.1023/B:JMSE.0000045298.76893.75 ↗
23. Akl · Appl. Surf. Sci. · 2004 · 221 · 31910.1016/S0169-4332(03)00951-6 ↗
24. Khan · J. Phys. Chem. · 1999 · B103 · 718410.1021/jp990066k ↗
25. J.D. Desai, H.M. Pathan, S.K. Min, K.D. Jung, O.S. Joo, Semicond. Sci. Tech., submitted for publication.
26. George · 1992
27. JCPDF File Nos. 39-1058, 33-0664 and 39-1346.
28. Kodas · 1999
29. Miller · Thin solid Films · 2004 · 466 · 30710.1016/j.tsf.2004.02.093 ↗