Atomic force microscopy based repeatable surface nanomachining for nanochannels on silicon substrates

Abstract The atomic force microscopy (AFM)-based repeatable nanomachining for nanochannels on bare silicon surfaces is investigated experimentally for automated nano manufacturing applications. The relationship between the normal force applied on the AFM cantilever and the channel depth is established and analyzed using both linear and logarithmic fits. Thus, current results can be regarded as the calibration reference in order to accurately predict the nanochannel depth for additional nanotechnology related applications. An accurate prediction of the depth is not only for accuracy and efficiency, but also to prevent a costly diamond tip from unnecessary wear and tear. Furthermore, the experimental results also reveal that the fabrication procedure is repeatable.