journal article·1999-04

Plasma-deposited amorphous silicon carbide films for micromachined fluidic channels

Dong-Sing Wuu, Ray-Hua Horng, Chia-Chi Chan, Yih-Shing Lee

Applied Surface Science· Volume 144-145
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Diamond and Carbon-based Materials Research · Plasma Diagnostics and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (8)

Show source-provided references
1. Kim · Thin Solid Films · 1995 · 261 · 19210.1016/S0040-6090(94)06473-3 ↗
2. Bassous · Appl. Phys. Lett. · 1977 · 31 · 13510.1063/1.89587 ↗
3. Terry · IEEE Trans. Electron Devices · 1979 · 26 · 188010.1109/T-ED.1979.19791 ↗
4. Gravesen · J. Micromech. Microeng. · 1993 · 3 · 16810.1088/0960-1317/3/4/002 ↗
5. Stoney · Proc. R. Soc. London, Ser. A · 1909 · 82 · 17210.1098/rspa.1909.0021 ↗
6. Gat · J. Mater. Res. · 1992 · 7 · 247810.1557/JMR.1992.2478 ↗
7. Mui · Phys. Rev. B · 1987 · 35 · 808910.1103/PhysRevB.35.8089 ↗
8. Basa · Thin Solid Films · 1990 · 192 · 12110.1016/0040-6090(90)90483-T ↗