High-resolution photoelectron spectroscopy analysis of sulfidation of brass at the rubber/brass interface

Abstract High resolution photoelectron spectroscopy is utilized to investigate the chemical composition at the rubber/brass interface to elucidate the origin of strong adhesion as well as the degradation between rubber and brass. Special attention has been given to copper sulfides formed at the interface during the vulcanization reaction at 170 °C. At least five sulfur-containing species are identified in the adhesive interlayer including crystalline CuS and amorphous CuxS (x ≃ 2). These copper sulfide species are not uniformly distributed within the layer, but there exits the concentration gradation; the concentration of CuxS is high in the region on the rubber side and is diminished in the deeper region, while vice versa for that of CuS. Degradation of the interface adhesive strength by prolonged vulcanization arises from the decrease in the CuxS/CuS ratio accompanying desulfurization of the adhesive layer.