Nucleation, growth and properties of Co nanostructures electrodeposited on n-Si(111)

Abstract In the present work, cobalt thin films deposited directly on n-Si(1 1 1) surfaces by electrodeposition in Watts bath have been investigated. The electrochemical deposition and properties of deposits were studied using cyclic voltammetry (CV), chronoamperometry (CA), ex situ atomic force microscopy (AFM), X-ray diffraction (XRD) and alternating gradient field magnetometer (AGFM) techniques. The nucleation and growth kinetics at the initial stages of Co studied by current transients indicate a 3D island growth (Volmer–Weber); it is characterized by an instantaneous nucleation mechanism followed by diffusion limited growth. According to this model, the estimated nucleus density and diffusion coefficient are on the order of magnitude of 10 6 cm −2 and 10 −5 cm 2 s −1 , respectively. AFM characterization of the deposits shows a granular structure of the electrodeposited layers. XRD measurements indicate a small grain size with the presence of a mixture of hcp and fcc Co structures. The hysteresis loops with a magnetic field in the parallel and perpendicular direction and showed that the easy magnetization axis of Co thin film is in the film plane.