Electrical resistivity and elastic wave propagation anisotropy in glancing angle deposited tungsten and gold thin films

Abstract We report on experimental investigations of electrical resistivity and surface elastic wave propagation in W and Au thin films sputter-deposited by glancing angle deposition. For both metals, the angle of deposition α is systematically changed from 0 to 85°. Dense and compact films are produced with a normal incident angle α = 0°, whereas inclined and porous columnar architectures are clearly obtained for the highest angles. Group velocities and DC electrical resistivities of W and Au films are significantly changed in x and y directions as α increases from 0 to 85°. Isotropic behaviors are always observed for Au films, whereas anisotropic velocity and resistivity are clearly measured in W films prepared with incident angles higher than 60°. The anisotropic coefficient reaches 1.8 for velocity and 2.0 for resistivity in W films, while it remains in-between 1.0 and 1.2 in Au films whatever the incident angle. This directional dependence of electrical resistivity and elastic wave propagation is connected to the anisotropic structural characteristics of W inclined columns (fanning of their cross-section), while Au columns exhibit a more symmetric growth as a function of the incident angle.