The pH-dependant attachment of ceria nanoparticles to silica using surface analytical techniques

Abstract The adhesion and removal of ceria particles to a silica surface was investigated with the use of X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and auger electron spectroscopy (AES) measurements. A model is presented based on electrophoretic mobility measurements of ceria slurry and silica particles at different pH's. XPS results show that at acidic pH values, ceria is present on silica surfaces, but at alkaline pH values, far less ceria is present, or no ceria is present in the extreme case. SEM results corroborated the XPS results showing uniform distribution of ceria particles on silica surface at pH 6 while a clean silica surface is observed at pH 12. However, SEM images show agglomeration of ceria particles occurring at the isoelectric point of ceria at ∼pH 9.6. High resolution Ce 3d XPS analysis indicates that ceria present on the surface is composed ∼31% Ce(III) and ∼69% Ce(IV). AES mapping done at specific points on the silica surface validated both XPS and SEM results. Based on XPS, SEM and AES analyses, it is clear that an alkaline pH is necessary to minimize particulate contamination of silica surface by ceria.