journal article·2006-11

Parametric study on femtosecond laser pulse ablation of Au films

Xiaochang Ni, Ching-yue Wang, Li Yang, Jianping Li, Lu Chai, Wei Jia, Ruobing Zhang, Zhigang Zhang

Applied Surface Science· Volume 253· Issue 3
Publisher page

Abstract

Abstract Ablation process of 1 kHz rate femtosecond lasers (pulse duration 148 fs, wavelength 775 nm) with Au films on silica substrates has been systemically studied. The single-pulse threshold can be obtained directly. For the multiple pulses the ablation threshold varies with the number of pulses applied to the surface due to the incubation effect. From the plot of accumulated laser fluence N × ϕ th ( N ) and the number of laser pulses N , incubation coefficient of Au film can be obtained ( s = 0.765). As the pulse energy is increased, the single pulse ablation rate is increasing following two ablation logarithmic regimes, which can be explained by previous research.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Laser Material Processing Techniques · Laser-induced spectroscopy and plasma · Laser-Ablation Synthesis of Nanoparticles

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (14)

Show source-provided references
1. Sub-micron scale patterning using femtosecond laser and self-assembled monolayers interaction10.1016/j.apsusc.2004.06.157 ↗
2. Plasma absorption of femtosecond laser pulses in dielectrics10.1115/1.1445135 ↗
3. Development of a femtosecond micromachining workstation by use of spectral interferometry10.1364/OL.30.000373 ↗
4. Ultrashort pulse laser ablation of polycarbonate and polymethylmethacrylate10.1016/S0169-4332(99)00474-2 ↗
5. Ultrashort-pulse laser ablation of indium phosphide in air10.1007/s003390000596 ↗
6. High speed ablation etching of GaN semiconductor using femtosecond laser10.1016/S0030-4018(01)01002-1 ↗
7. Laser-induced damage on single-crystal metal surfaces10.1364/JOSAB.5.000648 ↗
8. The thermal character analysis of femtosecond laser pulse parameters’ effect on metal surface
9. Measurement of the damage threshold of semiconductor saturable-absorber mirrors
10. Simple technique for measurement of pulsed Gaussian-beam spot sizes10.1364/OL.7.000196 ↗
11. Dammage threshold dependence on electron–photon coupling in Au and Ni films10.1016/S0169-4332(98)00002-6 ↗
12. Femtosecond pulse laser processing of TiN on silicon10.1016/S0169-4332(99)00481-X ↗
13. Ablation of metals by ultrashort laser pulses10.1364/JOSAB.14.002716 ↗
14. Sub-picosecond UV laser ablation of metals10.1007/BF01538207 ↗