Analysis of electrodeposition parameters influence on cobalt deposit roughness

Abstract Over the last years an increased interest has been seen in the electrodeposition of cobalt and cobalt alloys. An essential challenge in the electrodeposition of cobalt is to control the structure and morphology which, in turn, depends on the preparation conditions. The work presents an assessment of the influence of parameters of cobalt deposition in potentiostatic conditions on the structure and morphology of the obtained deposits surface. The level of development of electrocatalytically deposited cobalt layers was examined through microscope methods with the use of the atomic force microscope. Additionally, the samples structure was analysed using X-radiation. The conducted tests allow drawing the following conclusions. The level of surface development does not depend on the applied potential at which deposition of cobalt is carried out. Deposition at low potentials result in creating, on the surface the mixture of metallic cobalt and hydroxides with high level of surface development. High concentration of cobalt ions in the solution result in obtaining close values of the surface development level irrespective of the applied deposition potential.