Effect of post-annealing temperature on the microstructure and magnetic properties of Ce:YIG thin films deposited on Si substrates
Source abstract
Abstract
Abstract Amorphous Ce1Y2Fe5O12 (Ce:YIG) thin films deposited on single crystal Si(1 0 0) and thermally oxidized Si(1 0 0) substrates by pulsed laser deposition were annealed in the temperature range of 700–1000 °C in air. The annealing temperature dependence of microstructure and magnetic properties of Ce:YIG films was studied using X-ray diffraction combined with vibrating sample magnetometer. The results show that single phase of polycrystalline Ce:YIG thin films can be obtained by the post-annealing of as-deposited films at the temperature of 700 °C. However, two steps of phase segregation of Ce:YIG occur as the post-annealing temperature increases: at first, Ce:YIG is decomposed into YIG and non-magnetic CeO2 when annealed at 800 °C; then YIG continues to be decomposed forming Fe2O3 when the temperature is increased up to 900 °C. Consequently, the saturation magnetization of Ce:YIG films decreases first and then increases with the post-annealing temperature going up, which indicates that the saturation magnetization of Ce:YIG films is mainly related to the phase composition of the films. Meanwhile, the presence of SiO2 buffer layer can significantly enhance the saturation magnetization of Ce:YIG films.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Magneto-Optical Properties and Applications · Surface Roughness and Optical Measurements · Magnetic Properties and Synthesis of Ferrites
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (15)
Show source-provided references
1. Shintaku · Appl. Phys. Lett. · 1997 · 71 · 164010.1063/1.120003 ↗
2. Shintaku · Jpn. J. Appl. Phys. · 1996 · 35 · 468910.1143/JJAP.35.4689 ↗
3. Tsay · J. Magn. Magn. Mater. · 2002 · 239 · 49010.1016/S0304-8853(01)00669-2 ↗
4. Hayashi · Appl. Surf. Sci. · 2002 · 197 · 46310.1016/S0169-4332(02)00364-1 ↗
5. Gomi · J. Appl. Phys. · 1991 · 70 · 706510.1063/1.349786 ↗
6. Kucera · Solid State Commun. · 1989 · 69 · 111710.1016/0038-1098(89)90497-3 ↗
7. Kim · J. Appl. Phys. · 2001 · 89 · 438010.1063/1.1357463 ↗
8. Higuchi · IEEE Trans. Magn. · 2001 · 37 · 245110.1109/20.951200 ↗
9. Ezaki · Appl. Phys. Lett. · 1996 · 69 · 297710.1063/1.117749 ↗
10. Uno · J. Eur. Ceram. Soc. · 2001 · 21 · 195710.1016/S0955-2219(01)00150-9 ↗
11. Karim · IEEE Trans. Magn. · 1995 · 31 · 348510.1109/20.489544 ↗
12. Park · J. Magn. Magn. Mater. · 2001 · 231 · 25310.1016/S0304-8853(01)00068-3 ↗
13. Sekigima · J. Cryst. Growth · 2001 · 229 · 40910.1016/S0022-0248(01)01191-5 ↗
14. Wickersheim · J. Appl. Phys. · 1967 · 38 · 104810.1063/1.1709478 ↗
15. Kang · J. Appl. Phys. · 2005 · 97 · 10A31910.1063/1.1855460 ↗