journal article·2003-05

Contact angle of 63Sn–37Pb and Pb-free solder on Cu plating

Chien-Tai Lin, Kwang-Lung Lin

Applied Surface Science· Volume 214· Issue 1-4
Publisher page

Abstract

Abstract This study investigated the wetting behavior of 63Sn–37Pb and Pb-free solder on different surface roughness Cu plating. The Cu plating roughness was controlled by current density and deposition time. The contact angles were measured to investigate the wetting behavior. The contact angles of DI (de-ionized) water obey Wenzel’s equation and decrease with the increase of surface roughness. Daubing the flux on solder balls as well as on the Cu plating lowers the magnitude of contact angle by 2–23° and the deviation of measured values by 4–6°. The contact angles decrease with the increase of Cu substrate surface roughness in the temperature range of 250–280 °C. The cleaning effect of flux was analyzed by Auger electron spectroscopy. The oxide on the Cu substrate surface was well removed by flux. The carbon residue left behind on the substrate surface after reflow raises both the magnitude and the scattering of contact angle.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Electronic Packaging and Soldering Technologies · Adhesion, Friction, and Surface Interactions · 3D IC and TSV technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (25)

Show source-provided references
1. Eustathopolous · Acta Mater. · 1998 · 46 · 2319
2. Meier · JOM · 1999 · 51 · 4410.1007/s11837-999-0209-1 ↗
3. Wenzel · Ind. Eng. Chem. · 1936 · 28 · 98810.1021/ie50320a024 ↗
4. Ambrose · Acta Mater. · 1992 · 40 · 248310.1016/0956-7151(92)90317-8 ↗
5. Ambrose · Acta Mater. · 1993 · 40 · 239510.1016/0956-7151(93)90319-N ↗
6. Chen · J. Mater. Sci.: Mater. Electr. · 2000 · 11 · 279
7. Shuttleworth · Disc. Faraday Soc. · 1948 · 3 · 2610.1039/df9480300016 ↗
8. Nicholas · J. Mater. Sci. · 1986 · 21 · 714
9. Abtew · Mater. Sci. Eng. · 2000 · 27 · 9510.1016/S0927-796X(00)00010-3 ↗
10. Tu · Mater. Sci. Eng. R · 2001 · 34 · 110.1016/S0927-796X(01)00029-8 ↗
11. Kim · J. Mater. Res. · 1995 · 10 · 49710.1557/JMR.1995.0497 ↗
12. Wang · Metall. Mater. Trans. A · 1995 · 26 · 45910.1007/BF02664682 ↗
13. Kim · Mater. Chem. Phys. · 1998 · 53 · 16510.1016/S0254-0584(97)02076-2 ↗
14. Vianco · JOM · 1993 · 45 · 1410.1007/BF03222374 ↗
15. A.M. Jackson, P.T. Vianco, I. Artaki, in: Proceedings of the Seventh International SAMPE Electronics Conference, June 20–23, 1994, Parsippany, NJ, p. 381.10.1108/eb046259 ↗
16. L.E. Felton, C.H. Raeder, C.K. Havasy, D.B. Knorr, in: Proceedings of the 13th IEEE/CHMT International Symposium on Electronics Manufacturing Technology, Materials Engineering Department, Rensselaer Polytechnic Institute, Troy, NY, p. 300.
17. J.O’.M. Bockris, G.A. Razumney, Fundamental Aspects of Electrocrystallization, Plenum Press, New York, 1967, Chapter 9.10.1007/978-1-4684-0697-9_2 ↗
18. Young · Philos. Trans. Roy. Soc. London · 1805 · 95 · 6510.1098/rstl.1805.0005 ↗
19. Good · J. Am. Chem. Soc. · 1952 · 74 · 15041
20. Wolansky · Coll. Surf. A · 1999 · 156 · 38110.1016/S0927-7757(99)00098-9 ↗
21. Nakae · Acta Mater. · 1998 · 46 · 231310.1016/S1359-6454(97)00387-X ↗
22. Palasantzas · Acta Mater. · 2001 · 49 · 353310.1016/S1359-6454(01)00238-5 ↗
23. Bico · Coll. Surf. A · 2002 · 206 · 4110.1016/S0927-7757(02)00061-4 ↗
24. Yost · Acta Mater. · 1997 · 45 · 533710.1016/S1359-6454(97)00205-X ↗
25. Eustathopulos · Acta Mater. · 1998 · 46 · 2319