High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation
Source abstract
Abstract
HfO2 films were deposited by electron beam evaporation with different deposition parameters. The properties such as refractive index, weak absorption, and laser induced damage thresholds (LIDTs) of these films have been investigated. It was found that when pulsed Nd:YAG 1064 nm laser is used to investigate LIDT of films: Metallic character is the main factor that influences LIDTs of films obtained from Hf starting material by ion-assisted reaction, and films prepared with higher momentum transfer parameter P have fewer metallic character; The ion-assisted reaction parameters are key points for preparing high LIDT films and if the parameters are chose properly, high LIDT films can be obtained. (c) 2004 Elsevier B.V. All rights reserved.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Ion-surface interactions and analysis · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (16)
Show source-provided references
1. Reactive evaporation of low-defect hafnia
2. Defect formation in hafnium dioxide thin films10.1364/AO.39.001589 ↗
3. Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films10.1016/S0040-6090(01)01184-1 ↗
4. Evaporation ion assisted deposition of HfO2 coatings—some key points for high power laser applications10.1116/1.1287153 ↗
5. Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source10.1016/S0040-6090(99)00226-6 ↗
6. HfO2 films with high laser damage threshold10.1016/S0040-6090(99)00690-2 ↗
7. Optical and crystalline inhomogeneity in evaporated zirconia films10.1364/AO.24.003184 ↗
8. A new diffraction theory for the mirage effect and thermal lensing
9. Non-destructive evaluation of thin film coatings using a laser-induced surface thermal lensing effect10.1016/S0040-6090(96)09055-4 ↗
10. Annealing effects on structure and laser-induced damage threshold of Ta2O5/SiO2 dielectric mirrors10.1016/S0169-4332(03)00153-3 ↗
11. Laser-induced damage of a 1064nm ZnS/MgF2 narrow-band interference filter10.1364/AO.40.001950 ↗
12. ISO 11254-1:2000: lasers and laser-related equipment—determination of laser-induced damage threshold of optical surfaces. Part 1. 1-on-1 test.
13. Theory of laser-induced damage to optical coatings: inclusion initiated thermal explosion mechanism laser-induced damage in optical materials
14. Effect of impurities on laser induced damage to 1.06mm optical coating
15. Macleod · 1986
16. Muller Model for ion-assisted thin-film densification10.1063/1.336960 ↗