journal article·1997-04

Preparation of manganese silicide thin films by solid phase reaction

Jinliang Wang, Masaaki Hirai, Masahiko Kusaka, Motohiro Iwami

Applied Surface Science· Volume 113-114
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Semiconductor materials and interfaces · Surface and Thin Film Phenomena · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (13)

Show source-provided references
1. Walser · Appl. Phys. Lett. · 1976 · 28 · 62410.1063/1.88590 ↗
2. Tsaur · Appl. Phys. Lett. · 1981 · 38 · 92210.1063/1.92183 ↗
3. Tsaur · J. Appl. Phys. · 1985 · 57 · 189010.1063/1.334421 ↗
4. Eizenberg · J. Appl. Phys. · 1982 · 53 · 688510.1063/1.330029 ↗
5. Kawasumi · J. Mater. Sci. · 1981 · 16 · 35510.1007/BF00738624 ↗
6. Nishida · J. Mater. Sci. · 1972 · 7 · 43510.1007/BF02403407 ↗
7. Bost · J. Electron. Mater. · 1987 · 16 · 39810.1007/BF02655491 ↗
8. Bost · J. Appl. Phys. · 1985 · 58 · 269610.1063/1.335906 ↗
9. Iwami · Jpn. J. Appl. Phys. · 1990 · 29 · L47010.1143/JJAP.29.L470 ↗
10. Nakamura · Phys. Rev. B · 1990 · 41 · 1209210.1103/PhysRevB.41.12092 ↗
11. Iwami · Jpn. J. Appl. Phys. · 1990 · 29 · 135310.1143/JJAP.29.1353 ↗
12. Murata · Jpn. J. Appl. Phys. · 1971 · 10 · 67810.1143/JJAP.10.678 ↗
13. Archard · J. Appl. Phys. · 1961 · 32 · 150510.1063/1.1728385 ↗