Development of prominent PLD (Aurora method) suitable for high-quality and low-temperature film growth

Abstract We have developed a new pulsed laser deposition (PLD) method named “Aurora PLD” under application of the magnetic field from the substrate side. It is characterized by an activation and/or enhanced ionization of the ablated particles during transport from the target to substrate. Many basical findings suggested that the main mechanism is the electron recoil arising from the magnetic mirror effect which, in turn, gives rise to interaction of energetic electrons and atoms (or ions). It resulted in the room temperature epitaxy of (1 0 0)NiO on (0 0 1)MgO. Using the water-cooled magnetic platelet located between the target and substrate, the Eclipse–Aurora PLD worked well even at the heated substrate. Much better quality in SrTiO 3 film was obtained by this improved PLD.