Selective metal pattern formation and its EMI shielding efficiency

Abstract A novel method for selective metal pattern formation by using an enhanced life-time of photoexcited electron-hole pairs in bilayer thin film of amorphous titanium dioxide and hole-scavenger-containing poly(vinyl alcohol) was proposed. By UV-irradiation through photomask on the bilayer film, the photodefined image of photoelectrons could be easily and simply produced, consequently resulting in selective palladium (Pd) catalyst deposition by reduction. The successive electrolessplating on Pd catalysts and electroplating on electrolessplated pattern were possible. Furthermore, the electromagnetic interference shielding efficiencies of the metal mesh patterns with various characteristic length scales of line width and thickness were investigated.