Influence of target to substrate spacing on the properties of ITO thin films
Source abstract
Abstract
Abstract Indium tin oxide thin films were deposited at room temperature on glass substrates by RF magnetron sputtering. The structural, electrical and optical properties of the films showed a dependence on target to substrate spacing and annealing temperature. Films deposited with a target to substrate spacing of 4 cm showed the lowest resistivity of 3.07×10 −3 Ω cm and maximum band gap of 3.89 eV on annealing at a temperature of 250 °C under high vacuum for 1 h.
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Research context
OpenAlex topics: ZnO doping and properties · Gas Sensing Nanomaterials and Sensors · Transition Metal Oxide Nanomaterials
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