journal article·2001-08

Work function changes and surface chemistry of oxygen, hydrogen, and carbon on indium tin oxide

John A Chaney, Pehr E Pehrsson

Applied Surface Science· Volume 180· Issue 3-4
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Abstract

Abstract The surface chemistry of indium tin oxide (ITO) has been investigated with Auger electron spectroscopy (AES) and high resolution electron energy loss spectroscopy (HREELS). A vibrating Kelvin probe (KP) with a graphite reference was used to monitor the absolute work function (Φ) of ITO as a function of chemical modification. The ITO was exposed in situ to molecular hydrogen (H2), hot-filament-activated oxygen ( O 2 ∗ ), and hot-filament-activated deuterium ( D 2 ∗ ). The initial Φ of ITO was determined to be 5.2 eV, and surface chemical changes had strong effects on this value, as seen by KP. Exposure of clean ITO to O 2 ∗ increased Φ to ∼5.6 eV, but the increase was short-lived. The changes in Φ over time were correlated with the uptake of carbon impurities in ultra high vacuum (UHV), as monitored by AES. The HREELS of ITO revealed significant hydrocarbon impurities. Chemical reduction of ITO produced a metallic surface and dehydrogenated the adsorbed hydrocarbons. Both re-oxidation of metallic ITO and oxidation of clean ITO temporarily removed adventitious carbon from the surface, but oxidized ITO adsorbed an even larger quantity of carbon over time.
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OpenAlex topics: ZnO doping and properties · Advancements in Battery Materials · Transition Metal Oxide Nanomaterials

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References (74)

Show source-provided references
1. Ishida · J. Appl. Phys. · 1993 · 73 · 434410.1063/1.352818 ↗
2. Steckl · J. Appl. Phys. · 1980 · 51 · 389010.1063/1.328135 ↗
3. Zhu · Thin Solid Films · 2000 · 359 · 24410.1016/S0040-6090(99)00882-2 ↗
4. Libra · Vaccum · 1988 · 38 · 45510.1016/0042-207X(88)90587-8 ↗
5. Wu · Appl. Surf. Sci. · 1993 · 68 · 49710.1016/0169-4332(93)90233-2 ↗
6. Park · Appl. Phys. Lett. · 1996 · 68 · 269910.1063/1.116313 ↗
7. Mason · J. Appl. Phys. · 1999 · 86 · 168810.1063/1.370948 ↗
8. Wu · Appl. Phys. Lett. · 1997 · 70 · 134810.1063/1.118575 ↗
9. Sugiyama · J. Appl. Phys. · 2000 · 87 · 29510.1063/1.371859 ↗
10. Kim · Appl. Phys. Lett. · 1999 · 75 · 1910.1063/1.124263 ↗
11. Fujita · Jpn. J. Appl. Phys. · 1997 · 36 · 35010.1143/JJAP.36.350 ↗
12. Kim · Chem. Phys. Lett. · 1999 · 315 · 30710.1016/S0009-2614(99)01233-6 ↗
13. Kim · J. Appl. Phys. · 1998 · 84 · 685910.1063/1.368981 ↗
14. Christou · J. Appl. Phys. · 2000 · 88 · 518010.1063/1.1312847 ↗
15. Nüesch · J. Appl. Phys. · 2000 · 87 · 797310.1063/1.373482 ↗
16. Nüesch · Appl. Phys. Lett. · 1999 · 74 · 88010.1063/1.123397 ↗
17. Le · Appl. Phys. Lett. · 1999 · 75 · 135710.1063/1.124692 ↗
18. Monk · J. Mater. Sci. · 1999 · 10 · 101
19. Appleyard · Opt. Mater. · 1998 · 9 · 12010.1016/S0925-3467(97)00110-9 ↗
20. Appleyard · J. Mater. Chem. · 2000 · 10 · 16910.1039/a903708j ↗
21. Bharathan · J. Appl. Phys. · 1998 · 84 · 320710.1063/1.368473 ↗
22. Brown · Appl. Phys. Lett. · 1999 · 75 · 167910.1063/1.124789 ↗
23. Nüesch · Chem. Phys. Lett. · 1998 · 288 · 86110.1016/S0009-2614(98)00350-9 ↗
24. Oh · Langmuir · 1999 · 15 · 469010.1021/la9900268 ↗
25. Stößel · Phys. Chem. Chem. Phys. · 1999 · 1 · 179110.1039/a808595a ↗
26. Tanaka · Jpn. J. Appl. Phys. · 1995 · 34 · 325010.1143/JJAP.34.3250 ↗
27. Zuppiroli · Eur. Phys. J. B · 1999 · 11 · 50510.1007/s100510050962 ↗
28. Chkoda · Synth. Met. · 2000 · 111/112 · 31510.1016/S0379-6779(99)00355-0 ↗
29. Kiy · Synth. Met. · 2000 · 111/112 · 30710.1016/S0379-6779(99)00453-1 ↗
30. Kim · Appl. Phys. Lett. · 1999 · 74 · 344410.1063/1.124122 ↗
31. V.E. Henrich, P.A. Cox, The Surface Science of Metal Oxides, Cambridge University Press, Cambridge, 1994.
32. Balasubramanian · J. Electrochem. Soc. · 1991 · 138 · 32210.1149/1.2085565 ↗
33. Milliron · J. Appl. Phys. · 2000 · 87 · 57210.1063/1.371901 ↗
34. Kim · Synth. Met. · 2000 · 111/112 · 31110.1016/S0379-6779(99)00354-9 ↗
35. Moons · J. Phys. Chem. B · 1997 · 101 · 849210.1021/jp971071w ↗
36. Cox · J. Solid State Chem. · 1987 · 68 · 34010.1016/0022-4596(87)90321-5 ↗
37. Taga · Jpn. J. Appl. Phys. · 1998 · 37 · 658510.1143/JJAP.37.6585 ↗
38. Kamei · Thin Solid Films · 1995 · 259 · 3810.1016/0040-6090(94)06390-7 ↗
39. Song · Jpn. J. Appl. Phys. · 1998 · 37 · 187010.1143/JJAP.37.1870 ↗
40. Kamei · Appl. Phys. Lett. · 1994 · 64 · 271210.1063/1.111474 ↗
41. Kamei · Appl. Phys. Lett. · 1994 · 65 · 54610.1063/1.112292 ↗
42. de Boer · Rev. Sci. Instrum. · 1973 · 44 · 100310.1063/1.1686287 ↗
43. Engelhardt · J. Phys. E · 1977 · 10 · 113310.1088/0022-3735/10/11/013 ↗
44. Reihl · Phys. Rev. B · 1986 · 33 · 577010.1103/PhysRevB.33.5770 ↗
45. Purvis · J. Am. Chem. Soc. · 2000 · 122 · 180810.1021/ja992910q ↗
46. Barr · J. Phys. Chem. Solids · 1989 · 50 · 65710.1016/0022-3697(89)90001-2 ↗
47. Bregman · J. Vac. Sci. Technol. B · 1985 · 3 · 95910.1116/1.583022 ↗
48. White · Spectrochim. Acta · 1972 · 28A · 50110.1016/0584-8539(72)80237-X ↗
49. Porotnikov · Z. Neorg. Khim. · 1993 · 38 · 653
50. H. Ibach, D.L. Mills, Electron Energy Loss Spectroscopy, Academic Press, New York, 1982.10.1016/B978-0-12-369350-1.50007-5 ↗
51. Ovadyahu · J. Electrochem. Soc. · 1983 · 130 · 91710.1149/1.2119858 ↗
52. Peisner · Phys. Status Solidi A · 1971 · 4 · K18710.1002/pssa.2210040335 ↗
53. Beierlein · Synth. Met. · 2000 · 111/112 · 29510.1016/S0379-6779(99)00450-6 ↗
54. Michaelson · J. Appl. Phys. · 1977 · 48 · 472910.1063/1.323539 ↗
55. Hewitt · J. Appl. Phys. · 1980 · 51 · 262010.1063/1.327991 ↗
56. Dai · Appl. Surf. Sci. · 1992 · 59 · 19510.1016/0169-4332(92)90118-H ↗
57. Sen · Appl. Surf. Sci. · 1982 · 10 · 6310.1016/0378-5963(82)90135-0 ↗
58. Robinson · J. Vac. Sci. Technol. A · 1998 · 16 · 93710.1116/1.581215 ↗
59. Lee · Thin Solid Films · 1996 · 279 · 110.1016/0040-6090(96)08742-1 ↗
60. Golan · J. Appl. Phys. · 1992 · 72 · 92510.1063/1.351768 ↗
61. Golan · J. Vac. Sci. Technol. B · 1993 · 11 · 56710.1116/1.586802 ↗
62. Lehwald · Surf. Sci. · 1979 · 89 · 42510.1016/0039-6028(79)90628-9 ↗
63. Ibach · J. Vac. Sci. Technol. · 1978 · 15 · 40710.1116/1.569558 ↗
64. Akemann · Langmuir · 1995 · 11 · 119610.1021/la00004a027 ↗
65. Baró · Surf. Sci. · 1979 · 88 · 38410.1016/0039-6028(79)90082-7 ↗
66. Das · J. Appl. Phys. · 1996 · 79 · 852110.1063/1.362477 ↗
67. Otsuka · Bull. Chem. Soc. Jpn. · 1983 · 56 · 216110.1246/bcsj.56.2161 ↗
68. VanderKam · Langmuir · 1999 · 15 · 659810.1021/la990086d ↗
69. Henry · Infrared Phys. Technol. · 1995 · 36 · 77910.1016/1350-4495(95)91321-I ↗
70. Lee · Mater. Lett. · 1996 · 28 · 17910.1016/0167-577X(96)00056-0 ↗
71. Tamada · Thin Solid Films · 1998 · 315 · 4010.1016/S0040-6090(97)00466-5 ↗
72. J.F. O’Hanlon, A Users Guide to Vacuum Technology, Wiley, New York, 1989.
73. Tadayyon · J. Vac. Sci. Technol. A · 1999 · 17 · 177310.1116/1.581889 ↗
74. Kusano · Vaccum · 1998 · 51 · 78510.1016/S0042-207X(98)00291-7 ↗