journal article·2026-03

Effects of pre-deposited ultra-thin Al2O3 interlayer and post-annealing on SiO2/4H-SiC MOS capacitors

Chengxi Ding, Man Luo, Zhaopeng Bai, Zimo Zhou, Hong-Ping Ma

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OpenAlex topics: Silicon Carbide Semiconductor Technologies · Semiconductor materials and devices · Silicon and Solar Cell Technologies

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