Enhancing reflectivity of Mo/Si/C multilayers deposited on inclined substrates by substrate bias voltage
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Semiconductor materials and devices · Semiconductor materials and interfaces · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (54)
Show source-provided references
1. Nanometer interface and materials control for multilayer EUV-optical applications10.1016/j.progsurf.2011.08.001 ↗
2. EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates10.1364/OE.15.013997 ↗
3. Development of an EUVL collector with infrared radiation suppression
4. Achieving desired thickness gradients on flat and curved substrates10.1117/12.363643 ↗
5. Spontaneous formation of highly periodic nano-ripples in inclined deposition of Mo/Si multilayers10.1063/1.4991377 ↗
6. Mo/Si multilayers sputtered onto inclined substrates: experiments and simulations10.1364/OE.390216 ↗
7. Theory of nanoscale surface ripple formation during oblique-incidence thin film deposition10.1063/5.0049321 ↗
8. Texture in ITO films deposited at oblique incidence by ion beam sputtering10.1016/j.apsusc.2022.154677 ↗
9. Nanostructured Ti thin films by magnetron sputtering at oblique angles10.1088/0022-3727/49/4/045303 ↗
10. Microstructure of thin tantalum films sputtered onto inclined substrates: experiments and atomistic simulations10.1063/1.1579112 ↗
11. Impact of interface roughness on the performance of broadband blackbody absorber based on dielectric-metal film multilayers10.1364/OE.22.001952 ↗
12. Simultaneous creation of multiple vortex-antivortex pairs in momentum space in photonic lattices10.1117/1.AP.5.6.066007 ↗
13. The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
14. Control of surface mobility for conformal deposition of Mo/Si multilayers on saw-tooth substrates10.1016/j.apsusc.2013.07.136 ↗
15. Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance10.1364/AO.56.007462 ↗
16. Progress in Mo/Si multilayer coating technology for EUVL optics10.1117/12.390077 ↗
17. S. Braun, H. Mai, M. Moss, et al., Mo/Si multilayers with different barrier layers for applications as extreme ultraviolet mirrors, Jpn. J. Appl. Phys. 41(Part 1, No. 6B), 4074-4081 (2002).10.1143/JJAP.41.4074 ↗
18. Multi component EUV multilayer mirrors
19. Improved reflectance and stability of Mo/Si multilayers10.1117/1.1489426 ↗
20. Comparison of thermal stability of Mo/Si multilayers with different crystallinities of Mo layers10.1364/AO.482940 ↗
21. The structure of Mo/Si multilayers prepared in the conditions of ionic assistance10.1007/s00339-007-4337-6 ↗
22. Interface morphology of Mo/Si multilayer systems with varying Mo layer thickness studied by EUV diffuse scattering10.1364/OE.25.015441 ↗
23. Generation of subwavelength inverted pin beam via fiber end integrated plasma structure10.1117/1.APN.3.2.026003 ↗
24. Effect of ion beam etching on the surface roughness of bare and silicon covered beryllium films10.1016/j.surfcoat.2017.01.023 ↗
25. Perspectives on oblique angle deposition of thin films: from fundamentals to devices10.1016/j.pmatsci.2015.06.003 ↗
26. C-Ni amorphous multilayers studied by atomic force microscopy
27. Effect of magnetron sputtering parameters and stress state of W film precursors on WSe2 layer texture by rapid selenization10.1038/srep36451 ↗
28. Structure-related optical properties of thin films10.1116/1.573894 ↗
29. Microfractography of thin films
30. Influence of inclined substrate on process characteristics of directed energy deposition10.1016/j.optlastec.2020.106288 ↗
31. The mechanical behavior of nanoscale metallic multilayers: a survey10.1007/s10409-015-0401-1 ↗
32. Interface imperfections in metal/Si multilayers10.1063/1.351040 ↗
33. Interface-engineered EUV multilayer mirrors10.1016/j.mee.2006.01.126 ↗
34. Computer simulation of the sputtering of polyatomic multilayered materials with consideration of the spatial overlapping of the collision cascades10.1016/S0022-3115(96)00074-8 ↗
35. Ion beam mixing in metallic and semiconductor materials10.1016/0927-796X(94)90005-1 ↗
36. Interfacial effects during ion beam processing of metals10.1016/0921-5107(95)01455-1 ↗
37. Ion-beam induced atomic transport through bi-layer interfaces of low- and medium-Z metals and their nitrides10.1016/0927-796X(94)90001-9 ↗
38. High-angle annular dark-field microscopy of Mo/Si multilayer structures10.1016/0304-3991(92)90132-4 ↗
39. Silicon thermo-optic phase shifters: a review of configurations and optimization strategies10.1117/1.APN.3.4.044001 ↗
40. Effect of bias voltage on characteristics of multilayer Si-DLC film coated on AA6061 aluminium alloy10.1007/s11665-020-05397-2 ↗
41. Impact of surface roughness on the effective dielectric constants and subwavelength image resolution of metal-insulator stack lenses10.1364/OL.37.004317 ↗
42. Ion assisted growth of B4C diffusion barrier layers in Mo/Si multilayered structures10.1063/1.3693992 ↗
43. Temperature and bias-voltage dependent transport in magnetic tunnel junctions with low energy Ar-ion irradiated barriers10.1103/PhysRevB.68.224437 ↗
44. Nonspecular X-ray reflection from rough multilayers10.1103/PhysRevB.49.10668 ↗
45. Probing surface and interface morphology with grazing incidence small angle X-ray scattering10.1016/j.surfrep.2009.07.002 ↗
46. IMD: software for modelling the optical properties of multilayer films10.1063/1.168689 ↗
47. Desities of amorphous thin films10.1143/JJAP.18.1931 ↗
48. Effect of bias voltage on growth property of Cr-DLC film prepared by linear ion beam deposition technique10.1016/j.vacuum.2010.06.001 ↗
49. Effect of substrate bias voltage on the properties of magnetron-sputtered gadolinium layers10.1016/j.surfcoat.2007.01.017 ↗
50. Performance of multilayer coatings in relationship to microstructure of metal layers. characterization and optical properties of Mo/Si multilayers in extreme ultra-violet and x-ray ranges
51. Determination of optical constants of thin films in the EUV10.1364/AO.447152 ↗
52. Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers10.1117/1.OE.52.9.095104 ↗
53. Structure and extreme ultraviolet performance of Si/C multilayers deposited under different working pressures10.1364/AO.56.00C145 ↗
54. Influence of deposition rate on interface width of Mo/Si multilayers10.1016/j.tsf.2015.06.009 ↗