journal article·2017-11

Investigation of percolation thickness of sputter coated thin NiCr films on clear float glass

Selen Erkan, Erdem Arpat, Sven Peters

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Abstract

Abstract Percolation thickness of reactively sputtered nickel chromium (NiCr) thin films is reported in this study. Nickel-chromium films with the thicknesses in between 1 and 10 nm were deposited on 4 mm clear glass substrate by dc magnetron sputtering. Optical properties such as refractive index, extinction coefficient and also sheet resistance, carrier concentration and mobility of NiCr films were determined by a combination of variable-angle spectroscopic ellipsometry and four point probe measurements. We show both the percolation phenomena in atmosphere and critical percolation thickness for thin NiCr films by both electrical and optical techniques. The two techniques gave consistent results with each other.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Copper Interconnects and Reliability · Metal and Thin Film Mechanics · Optical Coatings and Gratings

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (11)

Show source-provided references
1. Glaser · 2000
2. Theory of the growth mode for a thin metallic film on an insulating substrate10.1016/S0039-6028(01)01692-2 ↗
3. Onset of electrical conduction in Pt and Ni films10.1063/1.357822 ↗
4. Percolation threshold in ultrathin titanium films determined by in-situ spectroscopic ellipsometry10.1103/PhysRevB.70.195406 ↗
5. Ellipsometric analysis of thin NiCr films10.1016/0040-6090(89)90703-7 ↗
6. Nowak · 2011
7. Analysis of the Drude model in metallic films10.1364/AO.40.006307 ↗
8. Ellipsometry investigation of the effects of annealing temperature on the optical properties of indium tin oxide thin films studied by Drude–Lorentz model10.1016/j.apsusc.2009.03.064 ↗
9. In situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thickness attainable with ellipsometry and photometry10.1016/S0040-6090(01)01040-9 ↗
10. Plasma frequency and dielectric function dependence on doping and temperature for p-type indium phosphide epitaxial films10.1088/0953-8984/24/43/435803 ↗
11. Sap · 2010