Surface generation and material removal behaviors in chemical–mechanical polishing of diamond with mixed abrasives
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Abstract
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Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Diamond and Carbon-based Materials Research · Tunneling and Rock Mechanics
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References (73)
Show source-provided references
1. The description of wear mechanism for diamond cutting tool with a new diamond model on gold substrate10.1016/j.diamond.2025.112526 ↗
2. Research progress of high thermal conductivity diamond/copper composites
3. Mechanical lapping and polishing process of polycrystalline diamond wafers
4. Development and challenges of surface planarization technology for single crystalline diamond
5. A review of high-efficiency and ultra-low damage processing mechanism and technology of diamond10.3901/JME.2024.03.337 ↗
6. Interactions between shuffle-set (001) dislocation and (111) twin boundary in nanotwinned diamond10.1016/j.carbon.2024.119643 ↗
7. Analytical force modeling for laser-assisted diamond machining of brittle materials10.1016/j.ijmecsci.2025.110494 ↗
8. Damage evolution mechanism and low-damage grinding technology of silicon carbide ceramics10.1088/2631-7990/ada218 ↗
9. Energy beam-based direct and assisted polishing techniques for diamond: a review10.1088/2631-7990/acfd67 ↗
10. Surface micro-morphology model involved in grinding of GaN crystals driven by strain-rate and abrasive coupling effects10.1016/j.ijmachtools.2024.104197 ↗
11. Nontraditional energy-assisted mechanical machining of difficult-to-cut materials and components in aerospace community: a comparative analysis10.1088/2631-7990/ad16d6 ↗
12. Effect of anisotropy on deformation and crack formation under the brittle removal of 6H-SiC during SPDT process10.1016/j.jare.2023.04.004 ↗
13. Nanoscale insight into brittle-to-ductile transition mechanism of 4H-SiC in single-grit nanogrinding10.1016/j.ijmecsci.2025.110579 ↗
14. Fiber reinforced ceramic matrix composites: from the controlled fabrication to precision machining10.1088/2631-7990/adeee1 ↗
15. Polishing mechanism and surface damage analysis of type IIa single crystal diamond processed by mechanical and chemical polishing methods10.1016/j.diamond.2015.11.021 ↗
16. Subsurface cleavage of diamond after high-speed three-dimensional dynamic friction polishing10.1016/j.diamond.2019.107600 ↗
17. Effect of grain boundary on polycrystalline diamond polishing by high-speed dynamic friction10.1016/j.diamond.2021.108461 ↗
18. Mechanism of photocatalysis-assisted chemical mechanical polishing of CVD single crystal diamond
19. Polishing of diamond, SiC, GaN based on the oxidation modification of hydroxyl radical: status, challenges and strategies10.1016/j.mssp.2023.107737 ↗
20. Micro-scale contact behavior and its effect on the material removal process during chemical mechanical polishing10.1016/j.triboint.2020.106831 ↗
21. Compliant grinding and polishing: a review10.1016/j.ijmachtools.2020.103634 ↗
22. Research progress in chemical mechanical polishing of diamond
23. Research status and prospect on polishing technology of large size single crystal diamond substrate10.3901/JME.2021.22.157 ↗
24. Thermochemical polishing of CVD diamond films10.1016/S0925-9635(98)00158-7 ↗
25. Quantitative analysis of carbon distribution in steel used for thermochemical polishing of diamond films10.1149/1.1406494 ↗
26. Achieving ultra-hard surface of mechanically polished diamond crystal by thermo-chemical refinement10.1016/j.apsusc.2014.08.057 ↗
27. Overview of patents on diamond polishing apparatus10.2174/0118722121307776240606073455 ↗
28. Femtosecond and nanosecond laser polishing of rough polycrystalline diamond10.1088/1555-6611/ac732c ↗
29. Research progress of laser polishing technology for material surface
30. Optical quality laser polishing of CVD diamond by UV pulsed laser irradiation10.1002/adom.202100537 ↗
31. Non-contact polishing of single crystal diamond by ion beam etching10.1016/j.diamond.2019.01.007 ↗
32. Nanosmoothing of single crystal diamond chips by 1 keV Ar+ ion bombardment10.1116/1.3298885 ↗
33. Highly efficient polishing of polycrystalline CVD diamond via atmosphere inductively coupled plasma
34. Damage-free highly efficient polishing of single-crystal diamond wafer by plasma-assisted polishing10.1016/j.cirp.2018.04.074 ↗
35. Two material removal modes in chemical mechanical polishing: mechanical plowing vs. chemical bonding10.1007/s40544-023-0799-6 ↗
36. Plasma-assisted polishing for atomic surface fabrication of single crystal SiC10.7498/aps.70.20202014 ↗
37. Field-assisted machining of difficult-to-machine materials10.1088/2631-7990/ad2c5e ↗
38. Atomistic understanding of rough surface on the interfacial friction behavior during the chemical mechanical polishing process of diamond10.1007/s40544-023-0760-8 ↗
39. Atomically flat high-purity (100) diamond surfaces: Conductivity of hydrogen terminated diamond10.1016/j.diamond.2025.112181 ↗
40. Atomic surface of diamond induced by novel green photocatalytic chemical mechanical polishing with high material removal rate10.1088/2631-7990/ad97f7 ↗
41. Chemical kinetics mechanism for chemical mechanical polishing diamond and its related hard-inert materials10.1007/s00170-017-1336-4 ↗
42. Improvement of material removal rate of single-crystal diamond by polishing using H2O2 solution10.1016/j.diamond.2016.09.028 ↗
43. Chemical mechanical polishing slurries for chemically vapor-deposited diamond films10.1115/1.4024034 ↗
44. An insight into polishing slurry for high quality and efficiency polishing of diamond10.1016/j.triboint.2022.107789 ↗
45. Photoelectrochemical mechanical polishing method for n-type gallium nitride10.1016/j.cirp.2019.04.121 ↗
46. Research advances on the influence of polyurethane polishing pad characteristics on chemical mechanical polishing performance
47. Polishing-pad-free electrochemical mechanical polishing of single-crystalline SiC surfaces using polyurethane–CeO2 core–shell particles10.1016/j.ijmachtools.2016.11.007 ↗
48. Review on advanced atomic-level polishing for single crystal diamond
49. The influence of Fenton reaction chemical parameters on the removal of single crystal diamond10.1016/j.diamond.2025.112040 ↗
50. A novel slurry for chemical mechanical polishing of single crystal diamond10.1016/j.apsusc.2021.150431 ↗
51. Experimental study on UV photocatalytic assisted chemical mechanical polishing process for single-crystal diamond10.1016/j.diamond.2025.112771 ↗
52. Simazine Fenton’s oxidation in a continuous reactor10.1016/j.apcatb.2003.11.009 ↗
53. Effects of reaction conditions on the oxidation efficiency in the Fenton process10.1016/S0043-1354(99)00388-7 ↗
54. Phase transition and plastic deformation mechanisms induced by self-rotating grinding of GaN single crystals10.1016/j.ijmachtools.2021.103827 ↗
55. Novel eco-friendly chemical mechanical polishing of aluminum alloy for achieving close atomic surface
56. Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: a study on polishing behavior and material removal mechanism10.1016/j.apsusc.2024.161157 ↗
57. Damage evolution and removal behaviors of GaN crystals involved in double-grits grinding10.1088/2631-7990/ad207f ↗
58. Atomic-level flat polishing of polycrystalline diamond by combining plasma modification and chemical mechanical polishing10.1016/j.cirp.2025.03.024 ↗
59. Polishing and planarization of single crystal diamonds: state-of-the-art and perspectives10.1088/2631-7990/abe915 ↗
60. Highly efficient finishing of large-sized single crystal diamond substrates by combining nanosecond pulsed laser trimming and plasma-assisted polishing10.1016/j.ceramint.2023.03.038 ↗
61. Damage-free highly efficient plasma-assisted polishing of a 20-mm square large mosaic single crystal diamond substrate10.1038/s41598-020-76430-6 ↗
62. The comparative studies of HF CVD diamond films by Raman and XPS spectroscopies10.1016/j.optmat.2019.109251 ↗
63. Optimizing high-quality single-crystal diamond through mechanochemical polishing with cerium oxide and diamond-mixed abrasive SG pad
64. Quantitative analysis of Raman spectral parameters for carbon fibers: practical considerations and connection to mechanical properties10.1007/s10853-021-06225-1 ↗
65. Investigation into atomistic reaction between abrasive and Co in H2O through ReaxFF MD and XPS10.1016/j.triboint.2024.110218 ↗
66. Study on the mechanism of chemical mechanical polishing on high-quality surface of single crystal diamond10.1016/j.jmapro.2023.09.029 ↗
67. Insight into the atomic-scale material removal of 4H-SiC electrochemical mechanical polishing (ECMP) using graphene oxide10.1016/j.triboint.2025.110803 ↗
68. Mechanistic insights into the synergistic effect of oxidizers and abrasives in chemical mechanical polishing of 4H-SiC wafer10.1016/j.ceramint.2025.07.097 ↗
69. Understand anisotropy dependence of damage evolution and material removal during nanoscratch of MgF2 single crystals10.1088/2631-7990/ac9eed ↗
70. Chemical–mechanical polishing of 4H silicon carbide wafers10.1002/admi.202202369 ↗
71. Dispersal mechanism of different dispersants and its effect on performance of 4H-SiC polishing slurry10.1016/j.ceramint.2024.11.373 ↗
72. Nanoscale tribological aspects of chemical mechanical polishing: a review10.1016/j.apsadv.2022.100286 ↗
73. Atomic-scale understanding of graphene oxide lubrication-assisted grinding of GaN crystals10.1016/j.ijmecsci.2025.109934 ↗