journal article·2025-07

Influence of oxidants on the characteristics of atomic layer deposited TiO2 thin films

Jae Hun Hwang, Ga Yeon Lee, Jin Joo Ryu, Ji Woon Choi, Take-Mo Chung, Young Yong Kim, Seung Hoon Oh, Sungjin Park, Youngkwon Kim, Gun Hwan Kim, Taeyong Eom

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OpenAlex topics: Semiconductor materials and devices · Electronic and Structural Properties of Oxides · Catalytic Processes in Materials Science

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