journal article·2024-12

Evaluating the electromigration effect on mechanical performance degradation of aluminum interconnection wires: A nanoindentation test with molecular dynamics simulation study

Shuo Feng, Leiming Du, Zhen Cui, Xi Zhu, Xuejun Fan, Guoqi Zhang, Jiajie Fan

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OpenAlex topics: Metal and Thin Film Mechanics · Copper Interconnects and Reliability · Semiconductor materials and devices

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