journal article·2024-02

Towards modeling of ZrO2 atomic layer deposition at reactor scale based on experimental kinetic approximation

Nhat-Minh Phung, Minh-Tan Ha, Si-Young Bae, Soonil Lee, Tae-Joo Park, Se-Hun Kwon, Seong-Min Jeong

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OpenAlex topics: Semiconductor materials and devices · Catalytic Processes in Materials Science · Electronic and Structural Properties of Oxides

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References (37)

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