journal article·2023-08

Surface hardening of extreme ultraviolet(EUV) photoresist by CS2 plasma for highly selective and low damage patterning

Won Jun Chang, Hee Ju Kim, Geun Young Yeom

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OpenAlex topics: Advancements in Photolithography Techniques · Integrated Circuits and Semiconductor Failure Analysis · Electron and X-Ray Spectroscopy Techniques

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