Enhancement of Laser-Induced Damage Threshold of HfO2 Thin Films via Substrate Heating During Magnetron Sputtering
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Semiconductor materials and devices · Advanced Surface Polishing Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (26)
Show source-provided references
1. High laser-induced damage threshold HfO2 films prepared by ion-assisted electron beam evaporation10.1016/j.apsusc.2004.09.083 ↗
2. Growth properties and optical properties for HfO2 thin films deposited by atomic layer deposition10.1016/j.jallcom.2017.11.222 ↗
3. Plasma-enhanced atomic layer deposition of HfO2 with substrate biasing: thin films for high-reflective mirrors10.1021/acsami.1c21889 ↗
4. Effect of annealing on the properties of plasma-enhanced atomic layer deposition grown HfO2 coatings for ultraviolet laser applications10.1016/j.jallcom.2023.169443 ↗
5. Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films10.1016/j.jallcom.2018.08.327 ↗
6. An innovative method for preparation of sol–gel HfO2 films with high laser-induced damage threshold after high-temperature annealing10.1016/j.apsusc.2021.149615 ↗
7. Effect of substrate negative bias on the microstructural, optical, mechanical, and laser damage resistance properties of HfO(2) thin films grown by DC reactive magnetron sputtering
8. Nanosecond multi-pulse laser-induced damage mechanisms in pure and mixed oxide thin films10.1016/j.tsf.2015.04.014 ↗
9. Interface and defects engineering for multilayer laser coatings10.1016/j.progsurf.2022.100663 ↗
10. The lattice thermal conductivity of hafnia: the influence of high-order scatterings and phonon coherence10.1063/5.0190047 ↗
11. The ultrafast laser pump-probe technique for thermal characterization of materials with micro/nanostructures10.1080/15567265.2017.1313343 ↗
12. Comprehensive analysis of the contribution from the heat capacity in thermal measurement on nanoscale thin films10.1063/5.0145266 ↗
13. Systematic investigations on doping dependent thermal transport properties of single crystal silicon by time-domain thermoreflectance measurements10.1016/j.ijthermalsci.2022.107558 ↗
14. ISO 11254-1:2011: lasers and laser-related equipment-determination of laser induced damage threshold of optical surfaces. Part 1. 1-on-1 test.
15. Effects of substrate temperature on the structural, optical and resistive switching properties of HfO2 films10.1016/j.tsf.2016.04.016 ↗
16. Effect of post deposition annealing on the optical properties of HfOxNy films
17. Effect of annealing on the properties of HfO2-Al2O3 mixture coatings for picosecond laser applications10.1016/j.apsusc.2021.152192 ↗
18. Effect of annealing on ion-beam-sputtered hafnium oxide thin films properties10.1016/j.optmat.2024.116241 ↗
19. Influence of hydrogen annealing on the properties of hafnium oxide thin films10.1016/j.matchemphys.2011.01.036 ↗
20. Structure and optical properties of HfO2 films on Si (100) substrates prepared by ALD at different temperatures10.1016/j.physb.2020.412065 ↗
21. Crystallinity effect on electrical properties of PEALD–HfO2 thin films prepared by different substrate temperatures
22. Effects of annealing on quality and stoichiometry of HfO2 thin films grown by RF magnetron sputtering10.1016/j.vacuum.2018.06.037 ↗
23. Investigation of interface roughness cross-correlation properties of optical thin films from total scattering losses10.1016/j.apsusc.2009.12.099 ↗
24. Effect of oxygen vacancies on the laser-induced damage resistance of Y_026Hf_074O_x thin films10.1364/OL.39.006470 ↗
25. Mechanism in damage variation of nanosecond laser-induced damage of germanium sheets in vacuum10.1016/j.optlastec.2022.108663 ↗
26. Numerical simulation of defect influence on nanosecond laser manufacturing10.1016/j.ijthermalsci.2022.107900 ↗