Investigation of charge transfer interaction in heterometallic precursors to control their surface reactivity for MOCVD of Pd-Cu alloy films
Source abstract
Abstract
Abstract The work aims to study main factors determining surface reactions mechanism of the heterometallic MOCVD precursors for multicomponent inorganic films. A set of theoretical and experimental techniques is proposed to investigate the electronic structure of the copper-palladium precursor to control its surface reactivity in MOCVD of Pd-Cu alloy films. The surface and bulk charge distribution in the heterometallic precursors CuPdL4 (1) and Cu(hfa)2PdLF2 (2) and parent monometallic complexes was carried out using both experimental X-ray photoelectron (XPS) and X-ray emission (XES) spectroscopies and theoretical techniques (DFT calculations and NBO analysis). Comparison of calculated and experimental atomic charges for monometallic and heterometallic complexes revealed the electronic density redistribution on oxygen and metal atoms due to electronic charge transfer interaction between monometallic fragments in the heterocomplex, which was confirmed by NBO analysis. The charge transfer intensity appeared to be stronger for the fluorinated precursor 2, indicating its greater resistance to thermal dissociation into monometallic fragments compared to 1, which was confirmed by the data on the bimetallic films composition. Thus, the evidenced charge transfer interaction can be altered by changing the composition of the precursors to control their surface reactivity and films composition.
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Research context
OpenAlex topics: Copper Interconnects and Reliability · Catalytic Processes in Materials Science · Electron and X-Ray Spectroscopy Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (37)
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