journal article·2014-07

Electronic structure of α-sexithiophene ultrathin films grown on passivated Si(001) surfaces

K. Hiraga, H. Toyoshima, H. Tanaka, K. Inoue, S. Ohno, K. Mukai, J. Yoshinobu, M. Tanaka

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Abstract

Abstract We have investigated the valence electronic states of α-sexithiophene (α-6T) on three passivated Si(0 0 1) surfaces, oxidized Si(0 0 1), water-adsorbed Si(0 0 1) and ethylene-adsorbed Si(0 0 1), using ultraviolet photoelectron spectroscopy (UPS). At a thickness of α-6T layer below 0.5 nm, clear features of the π states are observed for water-adsorbed Si(0 0 1) and ethylene-adsorbed Si(0 0 1), whereas broad features are observed for oxidized Si(0 0 1). This difference is attributed to the formation of well-ordered stacking on water-adsorbed Si(0 0 1) and ethylene-adsorbed Si(0 0 1).
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Research context

OpenAlex topics: Molecular Junctions and Nanostructures · Semiconductor materials and interfaces · Surface and Thin Film Phenomena

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References (20)

Show source-provided references
1. Fichou · J. Mater. Chem. · 2000 · 10 · 57110.1039/a908312j ↗
2. Prato · J. Phys. Chem. B · 1999 · 103 · 778810.1021/jp9905878 ↗
3. Heiner · Appl. Phys. Lett. · 2005 · 87 · 09350110.1063/1.2034105 ↗
4. Varene · J. Phys. Chem. Lett. · 2011 · 2 · 25210.1021/jz1016203 ↗
5. Hill · Chem. Phys. Lett. · 2000 · 327 · 18110.1016/S0009-2614(00)00882-4 ↗
6. Schwieger · J. Appl. Phys. · 2005 · 97 · 12371210.1063/1.1929860 ↗
7. Yoshikawa · Surf. Sci. · 2004 · 559 · 7710.1016/j.susc.2004.04.045 ↗
8. Inoue · Jpn. J. Appl. Phys. · 2006 · 45 · 179410.1143/JJAP.45.1794 ↗
9. Wagner · Org. Electron. · 2011 · 12 · 44210.1016/j.orgel.2010.12.011 ↗
10. Kiguchi · J. Appl. Phys. · 2003 · 94 · 486610.1063/1.1609637 ↗
11. Lin · J. Chem. Phys. · 2002 · 117 · 32110.1063/1.1480857 ↗
12. Wolkow · Annu. Rev. Phys. Chem. · 1999 · 50 · 4310.1146/annurev.physchem.50.1.413 ↗
13. Loi · Nat. Mater. · 2005 · 4 · 8110.1038/nmat1279 ↗
14. Toyoshima · Surf. Sci. · 2013 · 616 · 3610.1016/j.susc.2013.06.009 ↗
15. Yoshimoto · Org. Electron. · 2014 · 15 · 35610.1016/j.orgel.2013.11.030 ↗
16. Takakuwa · Appl. Surf. Sci. · 2003 · 216 · 13310.1016/S0169-4332(03)00501-4 ↗
17. Ohno · Phys. Rev. B · 2008 · 77 · 08531910.1103/PhysRevB.77.085319 ↗
18. Yoshinobu · Rev. Sci. Instrum. · 2008 · 79 · 07610710.1063/1.2960562 ↗
19. Fujimoto · J. Chem. Phys. · 1990 · 92 · 407710.1063/1.458561 ↗
20. Ivanco · J. Appl. Phys. · 2004 · 96 · 271610.1063/1.1775304 ↗