journal article·2023-11

High-κ Hf0.3Zr0.7O2 film with morphotropic phase boundary for DRAM capacitor by controlling H2O dose

Xin-Zhe Du, Zhen Luo, Sheng-Chun Shen, Wei-Ping Bai, Hui Gan, Yue-Wei Yin, Xiao-Guang Li

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OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices · MXene and MAX Phase Materials

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References (36)

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