journal article·2022-09

Low surface damage laser processing of silicon by laser-induced plasma etching (LIPE)

Robert Heinke, Martin Ehrhardt, Jens Bauer, Andriy Lotnyk, Pierre Lorenz, Roy Morgenstern, Thomas Lampke, Thomas Arnold, Klaus Zimmer

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Laser Material Processing Techniques · Advanced Surface Polishing Techniques · Diamond and Carbon-based Materials Research

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (22)

Show source-provided references
1. Direct femtosecond laser surface nano/microstructuring and its applications10.1002/lpor.201200017 ↗
2. Ultrafast lasers-reliable tools for advanced materials processing10.1038/lsa.2014.30 ↗
3. Ultrafast laser processing of materials: a review10.1364/AOP.7.000684 ↗
4. Insight into electronic mechanisms of nanosecond-laser ablation of silicon10.1063/1.2903527 ↗
5. Femtosecond-Laser-Ablation Dynamics in Silicon Revealed by Transient Reflectivity Change10.3390/mi13010014 ↗
6. Femtosecond laser ablation of silicon–modification thresholds and morphology10.1007/s003390100893 ↗
7. Evidence for phase-explosion and generation of large particles during high power nanosecond laser ablation of silicon10.1063/1.125894 ↗
8. Single-Shot Multi-Stage Damage and Ablation of Silicon by Femtosecond Mid-infrared Laser Pulses10.1038/s41598-019-56384-0 ↗
9. Generation of dense electron-hole plasmas in silicon10.1103/PhysRevB.61.2643 ↗
10. Effects of dopant type and concentration on the femtosecond laser ablation threshold and incubation behaviour of silicon10.1007/s00339-016-9969-y ↗
11. Ultrashort laser pulse ablation of copper, silicon and gelatin: effect of the pulse duration on the ablation thresholds and the incubation coefficients10.1007/s00339-016-9625-6 ↗
12. Effect of air breakdown with a focusing lens on ultrashort laser ablation10.1063/1.3665631 ↗
13. Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma10.1016/j.apsadv.2021.100169 ↗
14. Laser-induced reactive microplasma for etching of fused silica10.1007/s00339-020-04019-x ↗
15. Dry etching of germanium with laser induced reactive micro plasma10.1007/s40516-021-00147-1 ↗
16. Etching of SiC–SiC-composites by a laser-induced plasma in a reactive gas10.1016/j.ceramint.2021.09.084 ↗
17. Dynamics and 2D temperature distribution of plasma obtained by femtosecond laser-induced breakdown10.1088/1361-6463/ac42f8 ↗
18. Topic Review: Application of Raman Spectroscopy Characterization in Micro/Nano-Machining10.3390/mi9070361 ↗
19. A microscopic TEM study of the defect layers in cast-mono crystalline silicon wafers induced by diamond-wire sawing10.1063/5.0034896 ↗
20. Progress in Assessing Surface and Subsurface Integrity10.1016/S0007-8506(07)63248-X ↗
21. Gaudig, M., Physikalische Mechanismen der Bildung von Schwarzem Silizium bei maskenfreiem Plasmaätzen. 2018.
22. Outdiffusion and diffusion mechanism of oxygen in silicon10.1063/1.95969 ↗