journal article·2023-11

Nucleation and growth of low resistivity copper thin films on polyimide substrates by low-temperature atomic layer deposition

Zihong Gao, Chengli Zhang, Junhua Gao, Qiang Wang, Guanglong Xu, Hongtao Cao, Hongliang Zhang

Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Copper Interconnects and Reliability · Semiconductor materials and devices · Synthesis and properties of polymers

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (35)

Show source-provided references
1. Antioxidant High-Conductivity Copper Paste for Low-Cost Flexible Printed Electronics10.1038/s41528-022-00151-1 ↗
2. Flexible Copper Wires Through Galvanic Replacement of Zinc Paste: A Highly Cost-Effective Technology for Wiring Flexible Printed Circuits10.1039/C5TC01421B ↗
3. Electroless Plating Cycle Process for High-Conductivity Flexible Printed Circuits10.1021/acssuschemeng.1c04613 ↗
4. Highly conductive and flexible fiber for textile electronics obtained by extremely low-temperature atomic layer deposition of Pt10.1038/am.2016.182 ↗
5. Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)2 and Tertiary Butyl Hydrazine10.1021/acs.chemmater.7b02098 ↗
6. Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma10.1021/acs.chemmater.5b02137 ↗
7. Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc10.1002/anie.200900414 ↗
8. Transparent Electrodes Based on Ultrathin/Ultra Smooth Cu Films Produced Through Atomic Layer Deposition as New ITO-Free Organic Light-Emitting Devices10.1016/j.orgel.2018.03.036 ↗
9. Fabrication and Adhesion Strength of Cu/Ni-Cr/polyimide Films for Flexible Printed Circuits10.1016/j.mee.2011.01.071 ↗
10. Preparation and properties of adhesive-free double-sided flexible copper clad laminate with outstanding adhesion strength10.1177/0954008320988761 ↗
11. Surface Roughness Mediated Specularity Parameter of Thin Cu Films10.1063/5.0038887 ↗
12. Advanced Atomic Layer Deposition: Metal Oxide Thin Film Growth Using the Discrete Feeding Method10.1039/D2TC03485A ↗
13. Growth of Cu Metal Films at Room Temperature Using Catalyzed Reactions10.1021/cm902294e ↗
14. Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces10.1149/1.1850340 ↗
15. Impact of Precursor Exposure on Process Efficiency and Film Properties in Spatial Atomic Layer Deposition10.1016/j.cej.2020.126234 ↗
16. Atomic Layer Deposition of Copper Seed Layers10.1149/1.1391185 ↗
17. Thickness Dependent Electrical resistivity of Ultrathin (< 40 nm) Cu Films10.1016/S0040-6090(00)01818-6 ↗
18. Electrical Resistivity of Polycrystalline Cu Interconnects with Nano-Scale Linewidth10.1116/1.2151910 ↗
19. Copper Metalorganic Chemical Vapor Deposition Reactions of Hexafluoroacetylacetonate Cu(I) vinyltrimethylsilane and Bis (hexafluoroacetylacetonate) Cu(II) Adsorbed on Titanium Nitride10.1116/1.578721 ↗
20. Wagner · 1992 · 203
21. Trends in Copper Precursor Development for CVD and ALD Applications10.1149/2.0261501jss ↗
22. X-ray Photoelectron Spectroscopy and Infrared Spectroscopy Analysis of Pyromellitic Dianhydride-Oxydianiline Polyamide-Acid and Polyamide-Ester Imidization10.1116/1.576044 ↗
23. Physical and Spectroscopic Studies of the Nucleation and Growth of Copper Thin Films on Polyimide Surfaces by Chemical Vapor Deposition10.1021/la00001a057 ↗
24. Atomic Layer Epitaxy of Copper-Growth and Selectivity in the Cu(II)-2,2,6,6-tetramethyl-3,5-heptanedionate/H-2 Process10.1149/1.1838738 ↗
25. Adhesion Properties of Electroless-Plated Cu Layers on Polyimide Treated by Inductively Coupled Plasmas10.3938/jkps.51.187 ↗
26. Effect of Surface Roughness on the Adhesion Properties of Cu/Cr Films on Polyimide Substrate Treated by Inductively Coupled Oxygen Plasma10.1016/j.surfcoat.2005.05.021 ↗
27. Interfacial Interaction of In Situ Cu Growth on Tetrasulfide Self-Assembled Monolayer on Plasma Treated Parylene Surface10.1116/1.2333574 ↗
28. A Study on the Interfacial Composition of the Electroless Copper Plated BPDA-PDA Polyimide Sheet10.1039/b208102d ↗
29. Enhancement of Cu(hfac)2 Chemisorption on the Parylene Surface by N2 Plasma Surface Modification10.1149/1.2766606 ↗
30. Mechanisms of Copper Chemical Vapor Deposition10.1063/1.107370 ↗
31. Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD10.1002/admi.201700274 ↗
32. Nanometer-Thick Copper Films Grown by Thermal Atomic Layer Deposition10.1016/j.tsf.2015.06.053 ↗
33. Nucleation and Growth During Al2O3 Atomic Layer Deposition on Polymers10.1021/cm050704d ↗
34. Recent progress of atomic layer deposition on polymeric materials10.1016/j.msec.2016.01.093 ↗
35. Interdiffusion at the Polyimide-Cu Interface10.1116/1.573308 ↗