Ti thin-film reaction on SiO2/Si
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OpenAlex topics: ZnO doping and properties · Semiconductor materials and devices · Silicon Carbide Semiconductor Technologies
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References (15)
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1. Hiraki · Appl. Surf. Sci. · 1992 · 56–58 · 37010.1016/0169-4332(92)90258-Y ↗
2. Lefakis · 1986 · 54 · 133
3. Taubenblott · J. Appl. Phys. · 1982 · 53 · 630810.1063/1.331551 ↗
4. Butz · J. Vac. Sci. Technol. A · 1983 · 1 · 77110.1116/1.571997 ↗
5. Liehr · J. Vac. Sci. Technol. A · 1985 · 3 · 98310.1116/1.573371 ↗
6. Iida · Jpn. J. Appl. Phys. · 1990 · 29 · L36110.1143/JJAP.29.L361 ↗
7. Fukuda · Appl. Surf. Sci. · 1992 · 60/61 · 35910.1016/0169-4332(92)90444-3 ↗
8. 1984 · 295
9. Watanabe · Appl. Phys. Lett. · 1991 · 59 · 145810.1063/1.105287 ↗
10. Bentin · 1984 · 25 · 137
11. Pertorius · Solid-State Electron. · 1978 · 21 · 66710.1016/0038-1101(78)90335-0 ↗
12. Hattori · Appl. Phys. Lett. · 1983 · 43 · 47010.1063/1.94392 ↗
13. Ihara · Appl. Surf. Sci. · 1992 · 60/61 · 2210.1016/0169-4332(92)90391-A ↗
14. 1978 · 43
15. Morita · Appl. Surf. Sci. · 1992 · 60/61 · 46610.1016/0169-4332(92)90461-6 ↗