Characteristics of a mixed-gas cluster ion beam for time-of-flight secondary ion mass spectrometry
Source abstract
Abstract
The gas cluster ion beam (GCIB) is a valuable tool for surface analysis, providing new 3D mass analysis equipment possibilities. The main feature of the GCIB is that many particles are involved during the collision of the cluster ion beam with a sample surface. Studying the characteristics of the GCIB is essential for improving the performance of the analysis equipment. We evaluated the efficiency of the GCIB using a mixed-gas of Ar and CO2 as a primary ion beam for time-of-flight secondary ion mass spectrometry. We measured the characteristic factors and composition of the cluster ion beam depending on the mole fraction ratio of CO2/Ar. We measured that the CO2 composition of the output cluster ion beam rapidly increases to over 95% when the mole fraction ratio of CO2 increases by more than 10% in the injected mixed gas. Nevertheless, the optimal ratio of the CO2/Ar mole fraction (%) to increase the secondary ion efficiency was 96% CO2, which more than doubled the secondary ion efficiency over that of pure Ar clusters. The beam spot size began rapidly decreasing from 95% CO2, and it was reduced by up to 0.67 times at 100% CO2. According to the mixed-gas ratio, the sputtering yield of the Si wafer was 8 times lower than that of pure Ar clusters.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Ion-surface interactions and analysis · Diamond and Carbon-based Materials Research · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (33)
Show source-provided references
1. Secondary ion mass spectrometry: characterizing complex samples in two and three dimensions10.1021/ac303088m ↗
2. Chapter 5
3. Photon-assisted nanostructures of self-assembled soft materials10.1016/j.nantod.2021.101199 ↗
4. Protein identification by 3D OrbiSIMS to facilitate in situ imaging and depth profiling10.1038/s41467-020-19445-x ↗
5. ToF-SIMS of OLED materials using argon gas cluster ion beam: a promising approach for OLED inspection10.1016/j.apsusc.2019.144887 ↗
6. SIMS imaging in neurobiology and cell biology10.1039/C9JA00118B ↗
7. The magic of cluster SIMS10.1021/ac053355f ↗
8. Label free biochemical 2D and 3D imaging using secondary ion mass spectrometry10.1016/j.cbpa.2011.05.016 ↗
9. Development and experimental application of a gold liquid metal ion source10.1016/S0169-4332(02)00631-1 ↗
10. Cluster primary ion bombardment of organic materials10.1016/j.apsusc.2004.03.101 ↗
11. Gas cluster ion beams for secondary ion mass spectrometry10.1146/annurev-anchem-061516-045249 ↗
12. Energy-dependent fragmentation of polystyrene molecule using size-selected Ar gas cluster ion beam projectile10.1002/sia.3551 ↗
13. Gas cluster ion beam SEM for imaging of large tissue samples with 10-nm isotropic resolution10.1038/s41592-019-0641-2 ↗
14. Materials processing by gas cluster ion beams10.1016/S0927-796X(01)00034-1 ↗
15. Latest applications of 3D ToF-SIMS bio-imaging10.1116/1.4907727 ↗
16. TOF-SIMS with argon gas cluster ion beams: a comparison with C60+10.1021/ac200288v ↗
17. Molecular depth profiling with argon gas cluster ion beams10.1021/acs.jpcc.5b03482 ↗
18. Strongly reduced fragmentation and soft emission processes in sputtered ion formation from amino acid films under large Arn+ (n≤ 2200) cluster ion bombardment10.1002/rcm.5286 ↗
19. Gas cluster ion beam time-of-flight secondary ion mass spectrometry high-resolution imaging of cardiolipin speciation in the brain: identification of molecular losses after traumatic injury10.1021/acs.analchem.7b00164 ↗
20. CO2 cluster ion beam, an alternative projectile for secondary ion mass spectrometry10.1007/s13361-016-1423-z ↗
21. A fragment-free ionization technique for organic mass spectrometry with large Ar cluster ions10.1016/j.apsusc.2008.05.004 ↗
22. A mixed cluster ion beam to enhance the ionization efficiency in molecular secondary ion mass spectrometry10.1002/rcm.6793 ↗
23. High energy gas cluster ions for organic and biological analysis by time-of-flight secondary ion mass spectrometry10.1016/j.ijms.2014.05.015 ↗
24. Development of an argon gas cluster ion beam for ToF-SIMS analysis10.1002/bkcs.11840 ↗
25. ToF-SIMS analysis of an organic layer using toluene and its cluster ion beam projectiles generated by multiphoton ionization10.1016/j.apsusc.2018.07.157 ↗
26. Surface potential measurements of a polymer film following primary ion gun irradiation for ToF-SIMS analysis of insulator using a kelvin probe and the observation of effects from the vacuum gauge10.1016/j.apsusc.2020.146561 ↗
27. Estimation of keV submicron ion beam width using a knife-edge method10.1016/S0168-583X(03)01370-3 ↗
28. Coherence correlation interferometry in surface topography measurements
29. Etching characteristics with Ar-Cl2 gas mixed cluster ion beam
30. Molecular imaging of biological tissue using gas cluster ions10.1002/sia.5509 ↗
31. CO bond dissociation and induced chemical ionization using high energy (CO2)n+ gas cluster ion beam10.1007/s13361-018-2102-z ↗
32. J. Sarkar, Sputtering Materials for VLSI and Thin Film Devices. William Andrew, 2010.
33. Universal equation for argon gas cluster sputtering yields10.1021/jp402684c ↗