journal article·2013-04

Corrosion resistance of CrN thin films produced by dc magnetron sputtering

A. Ruden, E. Restrepo-Parra, A.U. Paladines, F. Sequeda

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Abstract

Abstract In this study, the electrochemical behavior of chromium nitride (CrN) coatings deposited on two steel substrates, AISI 304 and AISI 1440, was investigated. The CrN coatings were prepared using a reactive d.c. magnetron sputtering deposition technique at two different pressures (P1 = 0.4 Pa and P2 = 4 Pa) with a mixture of N 2 –Ar (1.5-10). The microstructure and crystallinity of the CrN coatings were investigated using X-ray diffraction. The aqueous corrosion behavior of the coatings was evaluated using two methods. The polarization resistance (Tafel curves) and electrochemical impedance spectra (EIS) in a saline (3.5% NaCl solution) environment were measured in terms of the open-circuit potentials and polarization resistance ( R p ). The results indicated that the CrN coatings present better corrosion resistance and R p values than do the uncoated steel substrates, especially for the coatings produced on the AISI 304 substrates, which exhibited a strong enhancement in the corrosion resistance. Furthermore, better behavior was observed for the coatings produced at lower pressures (0.4 Pa) than those grown at 4 Pa.
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Research context

OpenAlex topics: Metal and Thin Film Mechanics · GaN-based semiconductor devices and materials · Semiconductor materials and devices

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