Laser micro-nano processing of optoelectronic materials

Abstract Laser micro-nano processing technologies have been developed to address challenges that are otherwise difficult to solve in industrial applications and diverse scientific fields. These technologies offer designable patterning, arraying capabilities, three-dimensional (3D) processing, and high precision. Recent advancements in laser technologies have demonstrated their effectiveness as powerful tools for micro-nano processing of optoelectronic materials. By utilizing various laser techniques—such as laser-induced polymerization, laser ablation, laser-induced transfer, laser-directed assembly, and laser-assisted crystallization—broad applications in image sensors, displays, solar cells, lasers, anti-counterfeiting, and information encryption have been enabled. This review comprehensively summarizes recent progress in the laser micro-nano processing of optoelectronic materials, including the technologies used for preparation, patterning, arraying, and modification. These laser fabrication methods uniquely provide capabilities such as annealing, phase transitions, and ion exchange in optoelectronic materials. We also discuss the perspectives and challenges for future developments, including the advantages, disadvantages, and potential applications of different laser micro-nano processing technologies. With the rapid advancements in laser micro-nanofabrication, we foresee significant growth in advanced, high-performance optoelectronic applications. This review aims to provide researchers with insights into the current state and future prospects of laser-based micro-nano processing, encouraging further exploration and innovation in this promising field.