Quantum dot micro/nano patterns: advanced manufacturing for controlled assembly

Abstract As zero-dimensional nanomaterials, quantum dots (QDs) exhibit unique optoelectronic properties due to quantum confinement effects. These excellent properties make QD devices show broad application prospects in many frontier fields, such as new energy, sensing detection, anti-counterfeiting, and biomedical fields. The controlled assembly and patterning of QDs are becoming increasingly important for the development of QD-based optoelectronic devices. This need is especially evident in emerging applications such as flexible electronics, photonic integrated chips, biosensing arrays, and advanced display technologies, where high-resolution patterning plays a key role. Due to the inherent challenges of QDs, including limited photostability, surface charge sensitivity, and thermal instability, it is important to systematically review recent advances in patterning techniques to guide practical applications. Here, this review summarizes recent advances in QD patterning techniques realized by various driving mechanisms such as light, electric fields, thermal effects, and mechanical forces, and interfacial energy. It aims to achieve controllable assembly of QDs through advanced manufacturing methods, resulting in the formation of precise QD patterns. Moreover, a detailed summary is provided for each QD patterning technique, and the limitations and distinctive advantages of different strategies are analyzed. It will provide guidance for selecting appropriate technical methods to handle colloidal QDs throughout the entire manufacturing process of patterned QD devices. Finally, future directions for QD patterning are outlined, including hybrid multi-driving-force approaches, multidimensional patterning, emerging pattern-formation mechanisms, AI-assisted process optimization, an integrated industrial ecosystem, and commercialization.