journal article·2022-11-18Open access

Recent Progress in On-Chip Erbium-Based Light Sources

Bo Wang, Peiqi Zhou, Xingjun Wang

Applied Sciences· Volume 12· Issue 22

Abstract

In recent years, silicon photonics has achieved great success in optical communication area. More and more on-chip optoelectronic devices have been realized and commercialized on silicon photonics platform, such as silicon-based modulators, filters and detectors. However, on-chip light sources are still not achieved because that silicon is an indirect bandgap material. To solve this problem, the rare earth element erbium (Er) is considered, which emits light covering 1.5 μm to 1.6 μm and has been widely used in fiber amplifiers. Compared to Er-doped fiber amplifiers (EDFA), the Er ion concentration needs to be more than two orders higher for on-chip Er-based light sources due to the compact size integration requirements. Therefore, the choice of the host material is crucially important. In this paper, we review the recent progress in on-chip Er-based light sources and the advantages and disadvantages of different host materials are compared and analyzed. Finally, the existing challenges and development directions of the on-chip Er-based light sources are discussed.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Photonic and Optical Devices · Advanced Fiber Laser Technologies · Silicon Nanostructures and Photoluminescence

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of Advanced Optical Communication Systems and Networks, School of Electronics, Peking University, Beijing 100871, China

National Information Optoelectronics Innovation Center, Wuhan 430074, China

Frontier Science Center for Nano-Optoelectronics, Peking University, Beijing 100871, China

Peking University Yangtze Delta Institute of Optoelectronics, Nantong 226010, China

Peng Cheng Laboratory, Shenzhen 518055, China

Funding

National Key Research and Development Program of China · National Natural Science Foundation of China under Grant · Beijing Municipal Natural Science Foundation

References (80)

Show source-provided references
1. Cramming more components onto integrated circuits
2. More than Moore
3. Silicon-based optoelectronics10.1109/5.248958 ↗
4. Perspective on the future of silicon photonics and electronics10.1063/5.0050117 ↗
5. Programmable photonic circuits10.1038/s41586-020-2764-0 ↗
6. Towards silicon photonic neural networks for artificial intelligence Sci10.1007/s11432-020-2872-3 ↗
7. Noisy propagation of Gaussian states in optical media with finite bandwidth10.1038/s41598-022-15865-5 ↗
8. Continuous-variable entanglement dynamics in Lorentzian environment10.1016/j.physleta.2022.128022 ↗
9. A design method for high fabrication tolerance integrated optical mode multiplexer10.1007/s11432-020-2888-2 ↗
10. Silicon optical modulators10.1038/nphoton.2010.179 ↗
11. High-performance Ge-on-Si photodetectors10.1038/nphoton.2010.157 ↗
12. Microcomb-driven silicon photonic systems10.1038/s41586-022-04579-3 ↗
13. Polarization-transparent silicon photonic add-drop multiplexer with wideband hitless tuneability10.1038/s41467-021-24640-5 ↗
14. Recent progress in lasers on silicon10.1038/nphoton.2010.167 ↗
15. Heteroepitaxial technologies of III–V on Si10.1016/S0927-0248(00)00209-9 ↗
16. An investigation on surface conditions for Si molecular beam epitaxial (MBE) growth10.1116/1.573116 ↗
17. Reduction of threading dislocation density in InP-on-Si heteroepitaxy with strained short-period superlattices10.1063/1.118087 ↗
18. Misfit stress dependence of dislocation density reduction in GaAs films on Si substrates grown by strained-layer superlattices10.1063/1.101052 ↗
19. Low threading dislocation density GaAs on Si(100) with InGaAs/GaAs strained-layer superlattice grown by migration-enhanced epitaxy10.1143/JJAP.30.L668 ↗
20. Method to obtain low-dislocation-density regions by patterning with SiO2 on GaAs/Si followed by annealing10.1143/JJAP.33.L1442 ↗
21. Self-organized In0.4Ga0.6As quantum-dot lasers grown on Si substrates10.1063/1.123548 ↗
22. 1.3-μm InAs/GaAs quantum-dot lasers monolithically grown on Si substrates10.1364/OE.19.011381 ↗
23. Heat-sink free CW operation of injection microdisk lasers grown on Si substrate with emission wavelength beyond 1.3 μm10.1364/OL.42.003319 ↗
24. Monolithic quantum-dot distributed feedback laser array on silicon10.1364/OPTICA.5.000528 ↗
25. Tunable quantum dot lasers grown directly on silicon10.1364/OPTICA.6.001394 ↗
26. Quantum dot lasers and amplifiers on silicon: Recent advances and future developments10.1109/MNANO.2020.3048094 ↗
27. Recent progress in heterogeneous III-V-on-silicon photonic integration
28. A review of silicon-based wafer bonding processes, an approach to realize the monolithic integration of Si-CMOS and III–V-on-Si wafers10.1088/1674-4926/42/2/023106 ↗
29. Hybrid silicon evanescent laser fabricated with a silicon waveguide and III-V offset quantum wells10.1364/OPEX.13.009460 ↗
30. Electrically pumped hybrid AlGaInAs-silicon evanescent laser10.1364/OE.14.009203 ↗
31. Santis, C.T., Vilenchik, Y., Yariv, A., Satyan, N., and Rakulijic, G. (2015, January 10–15). Sub-kHz quantum linewidth semiconductor laser on silicon chip. Proceedings of the 2015 Conference on Lasers and Electro-Optics (CLEO), San Jose, CA, USA.10.1364/CLEO_AT.2015.JTh5A.7 ↗
32. Back-side-on-BOX heterogeneously integrated III-V-on-silicon O-band distributed feedback lasers10.1109/JLT.2020.2978413 ↗
33. Yu, H., Doussiere, P., Patel, D., Lin, W., Hemyari, K., Park, J., Jan, C., Herrick, R., Hoshino, I., and Busselle, L. (2020, January 8–12). 400Gbps Fully Integrated DR4 Silicon Photonics Transmitter for Data Center Applications. Proceedings of the 2020 Optical Fiber Communications Conference and Exhibition (OFC), San Diego, CA, USA. paper T3H.6.10.1364/OFC.2020.T3H.6 ↗
34. High-power thulium lasers on a silicon photonics platform10.1364/OL.42.001181 ↗
35. Broadband 2-μm emission on silicon chips: Monolithically integrated Holmium lasers10.1364/OE.26.002220 ↗
36. Monolithically integrated Er-doped tunable laser on a CMOS-compatible silicon photonics platform10.1364/OE.26.016200 ↗
37. Fabrication of low-loss optical fibers containing rare-earth ions10.1049/el:19850520 ↗
38. Erbium-doped integrated waveguide amplifiers and lasers10.1002/lpor.201000015 ↗
39. Giant optical gain in a single-crystal erbium chloride silicate nanowire10.1038/nphoton.2017.115 ↗
40. Ultra-high on-chip optical gain in erbium-based hybrid slot waveguides10.1038/s41467-019-08369-w ↗
41. A photonic integrated circuit–based erbium-doped amplifier10.1126/science.abo2631 ↗
42. Erbium silicate compound optical waveguide amplifier and laser10.1364/OME.8.002970 ↗
43. Photoluminescence characterization of Er-implanted Al2O3 films10.1063/1.109136 ↗
44. Gain bandwidth of 80 nm and 2 dB/cm peak gain in Al2O3:Er3+ optical amplifiers on silicon10.1364/JOSAB.27.000187 ↗
45. CMOS-compatible 75 mW Er-doped distributed feedback laser10.1364/OL.39.003106 ↗
46. Uniformly spaced λ/4-shifted Bragg grating array with wafer-scale CMOS-compatible process10.1364/OL.38.004002 ↗
47. Monolithic erbium- and ytterbium-doped microring lasers on silicon chips10.1364/OE.22.012226 ↗
48. Resonant pumped Er-doped waveguide lasers using distributed Bragg reflector cavities10.1364/OL.41.001189 ↗
49. High-gain waveguide amplifiers in Si3N4 technology via double-layer monolithic integration10.1364/PRJ.401055 ↗
50. Fabrication and characterization of Er silicates on SiO2/Si substrates10.1063/1.3192407 ↗
51. Extraordinary infrared photoluminescence efficiency of Er0.1Yb1.9SiO5 films on SiO2/Si substrates10.1063/1.3554750 ↗
52. Photoluminescence enhancement and high gain amplification of ErxY2-xSiO5 waveguide
53. Energy transfer mechanisms in Er-Yb-Y disilicate thin films10.1063/1.4730434 ↗
54. Large electroluminescence excitation cross section and strong potential gain of Er in ErYb silicate10.1063/1.4795153 ↗
55. Effect of deposition mechanisms on the infrared photoluminescence of erbium-ytterbium silicate films under different sputtering methods10.1063/1.5089677 ↗
56. Self-assembled infrared-luminescent Er-Si-O crystallites on silicon10.1063/1.1814814 ↗
57. Concentration dependence of the Er3+ visible and infrared luminescence in Y2−xErxO3 thin films on Si10.1063/1.3195077 ↗
58. Thermal evolution of Er silicate thin films grown by rf magnetron sputtering10.1088/0953-8984/20/45/454218 ↗
59. A low-fabrication-temperature, high-gain chip-scale waveguide amplifier10.1007/s11432-021-3360-0 ↗
60. Optical amplification in Er/Yb silicate strip loaded waveguide10.1063/1.3655330 ↗
61. Hybrid Si3N4-Er/Yb Silicate Waveguides for Amplifier Application10.1109/LPT.2012.2190276 ↗
62. Optical amplification in Er/Yb silicate slot waveguide10.1364/OL.37.001427 ↗
63. A sub-kHz narrow-linewidth, and hundred-mW high-output-power silicon-based Er silicate laser with hybrid pump and signal co-resonant cavity10.1109/JPHOT.2019.2960324 ↗
64. A high-power, high-efficiency hybrid silicon-based Er silicate-silicon nitride waveguide laser10.1109/JQE.2020.2964982 ↗
65. Design of an on-chip electrically driven, position-adapted, fully integrated Er-based waveguide amplifier for silicon photonics10.1364/OSAC.413492 ↗
66. Status and potential of lithium niobate on insulator (LNOI) for photonic integrated circuits10.1002/lpor.201700256 ↗
67. Integrated lithium niobate photonics10.1515/nanoph-2020-0013 ↗
68. Integrated lithium niobate electro-optic modulators operating at CMOS-compatible voltages10.1038/s41586-018-0551-y ↗
69. High-performance hybrid silicon and lithium niobate Mach–Zehnder modulators for 100 Gbit s−1 and beyond10.1038/s41566-019-0378-6 ↗
70. Periodically poled thin-film lithium niobate microring resonators with a second-harmonic generation efficiency of 250,000%/W10.1364/OPTICA.6.001455 ↗
71. Self-starting bi-chromatic LiNbO3 soliton microcomb10.1364/OPTICA.6.001138 ↗
72. On-Chip Generation and Manipulation of Entangled Photons Based on Reconfigurable Lithium-Niobate Waveguide Circuits10.1103/PhysRevLett.113.103601 ↗
73. On-chip second-harmonic generation and broadband parametric down-conversion in a lithium niobate microresonator10.1364/OE.25.024531 ↗
74. A high-gain cladded waveguide amplifier on erbium doped thin-film lithium niobate fabricated using photolithography assisted chemo-mechanical etching10.1515/nanoph-2021-0737 ↗
75. A single-frequency single-resonator laser on Er-doped lithium niobate on insulator10.1063/5.0061815 ↗
76. Er-doped lithium niobate thin film waveguide amplifier with 16 dB internal net gain10.1109/JSTQE.2021.3137192 ↗
77. New CMOS-compatible platforms based on silicon nitride and Hydex for nonlinear optics10.1038/nphoton.2013.183 ↗
78. High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits10.1038/s41467-021-21973-z ↗
79. Silicon nitride CMOS-compatible platform for integrated photonics applications at visible wavelengths10.1364/OE.21.014036 ↗
80. Munoz, P., Mico, G., Bru, L.A., Pastor, D., Perez, D., Domenech, J.D., Fernandez, J., Banos, R., Gargallo, B., and Alemany, R. (2017). Silicon nitride photonic integration platforms for visible, near-infrared and mid-infrared applications. Sensors, 17.10.3390/s17092088 ↗